Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Inpyo Kim"'
Autor:
Mihyang Sheen, Yunhyuk Ko, Dong-uk Kim, Jongil Kim, Jin-ho Byun, YongSeok Choi, Jonghoon Ha, Ki Young Yeon, Dohyung Kim, Jungwoon Jung, Jinyoung Choi, Ran Kim, Jewon Yoo, Inpyo Kim, Chanwoo Joo, Nami Hong, Joohee Lee, Sang Ho Jeon, Sang Ho Oh, Jaekwang Lee, Nari Ahn, Changhee Lee
Publikováno v:
Nature. 608:56-61
Indium gallium nitride (InGaN)-based micro-LEDs (μLEDs) are suitable for meeting ever-increasing demands for high-performance displays owing to their high efficiency, brightness and stability
Autor:
Inpyo Kim
Publikováno v:
The Journal of East-West Comparative Literature. 58:31-51
Autor:
Inpyo Kim
Publikováno v:
Modern Studies in English Language & Literature. 64:2-20
Autor:
Jinho Byun, Ki Young Yeon, Jungwoon Jung, Ko Yunhyuk, Jinyoung Choi, Changhee Lee, Jongil Kim, Ahn Nari, Do hyung Kim, Ran Kim, Nami Hong, Joohee Lee, Dong Uk Kim, Sang Ho Jeon, Mihyang Sheen, Sang Ho Oh, Chanwoo Joo, Jaekwang Lee, Jewon Yoo, Inpyo Kim
Demands for high-performance displays with high pixel density and picture quality are ever increasing. Indium gallium nitride (InGaN)-based micro-LEDs (μLEDs) are suitable for meeting such demands owing to their high efficiency, brightness, and stab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d958efe006333dd767f4ec98d9972da
https://doi.org/10.21203/rs.3.rs-942933/v1
https://doi.org/10.21203/rs.3.rs-942933/v1
Autor:
Seungheon Na, Jaekwang Kim, Kushlendra Mishra, Kiwook Park, Peter Buck, Inpyo Kim, Rachit Sharma, Ingo Bork, Dongeun Cha
Publikováno v:
Photomask Technology 2021.
Model-based Mask Process Correction (MPC) is an indispensable data processing step for producing masks for advanced wafer production nodes. Typically, calibration of an MPC model may require several thousands SEM measurements. However, due to metrolo
Autor:
Inpyo Kim
Publikováno v:
Modern Studies in English Language & Literature. 63:19-38
Autor:
Inpyo Kim
Publikováno v:
The Journal of East-West Comparative Literature. 40:37-56
Autor:
Inpyo Kim, Joona Bang, Frank Caruso, Hyunjung Shin, Jeongju Park, Jinhan Cho, Youn Sang Kim, Min Jung Lee
Publikováno v:
Advanced Materials. 20:1843-1848
Autor:
Chiyoung Lee, Hyunjung Shin, Jaegab Lee, Yong Mu Kim, Inpyo Kim, Jeongju Park, Jinhan Cho, Frank Caruso, Jang-Sik Lee
Publikováno v:
Nature Nanotechnology. 2:790-795
We describe a versatile approach for preparing flash memory devices composed of polyelectrolyte/gold nanoparticle multilayer films. Anionic gold nanoparticles were used as the charge storage elements, and poly(allylamine)/poly(styrenesulfonate) multi
Autor:
Michael Ben Yishai, Sunghyun Oh, Yulian Wolff, Inpyo Kim, Changreol Kim, Aviram Tam, DaeHo Hwang
Publikováno v:
SPIE Proceedings.
Advanced photomasks exploit complex patterns that show little resemblance to the target printed wafer pattern. The main mask pattern is modified by various OPC and SRAF features while further complexity is introduced as source-mask-optimization (SMO)