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pro vyhledávání: '"Inn-hao Chen"'
Autor:
Inn-hao Chen, 陳英豪
103
In this thesis, fabrication and characterization of germanium (Ge) quantum-dot (QD) single-electron transistors (SETs) as well as the associated applications were investigated. Using the fidelity of spacer-layer deposition and nanopattern-de
In this thesis, fabrication and characterization of germanium (Ge) quantum-dot (QD) single-electron transistors (SETs) as well as the associated applications were investigated. Using the fidelity of spacer-layer deposition and nanopattern-de
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/89943931520781236323
Autor:
Inn-hao Chen, 陳英豪
97
This thesis demonstrates that polycrystalline silicon (poly-Si) thin-film transistors (TFTs) incorporating germanium (Ge) quantum dots (QDs) in the gate oxide were fabricated as efficient blue to near ultraviolet phototransistors for light de
This thesis demonstrates that polycrystalline silicon (poly-Si) thin-film transistors (TFTs) incorporating germanium (Ge) quantum dots (QDs) in the gate oxide were fabricated as efficient blue to near ultraviolet phototransistors for light de
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/6nck4j
Autor:
Inn Hao Chen, Ching Yuan Su, Kuan I. Ho, Chi-Hsien Huang, Takeru Okada, Chao-Sung Lai, Lain-Jong Li, Pei-Wen Li, Chien Chou, Seiji Samukawa
Publikováno v:
Carbon. 61:229-235
Top-down process, comprising lithography and plasma etching is widely used in very-large-scale integration due to its scalability, has the greatest potential to fabricate graphene nanoribbon based nanoelectronic devices for large-scale intergraded ci
Publikováno v:
ECS Meeting Abstracts. :262-262
not Available.
Publikováno v:
ECS Meeting Abstracts. :3023-3023
not Available.