Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Ingrid Cornelissen"'
Publikováno v:
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 ISBN: 9780429070716
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9a37be8427cb1bd3beb15fa954d9a98
https://doi.org/10.1201/9780429070716-29
https://doi.org/10.1201/9780429070716-29
Autor:
Marc Meuris, Sophia Arnauts, Ingrid Cornelissen, K. Kenis, M. Lux, Stefan De Gendt, Paul W. Mertens, I. Teerlinck, R. Vos, L. Loewenstein, M.M. Heyns, Klaus Wolke
Publikováno v:
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 ISBN: 9780429070716
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b64cfdee5b41575c6bbb02ae5d9b86b
https://doi.org/10.1201/9780429070716-6
https://doi.org/10.1201/9780429070716-6
Autor:
Michel Houssa, Lee M. Loewenstein, Paul W. Mertens, Twan Bearda, Ingrid Cornelissen, S. De Gendt, I. Terrlinck, Rita Vos, M.M. Heyns, K. Kenis, M. Meuris
Publikováno v:
Microelectronic Engineering. 48:199-206
Autor:
K. Wolke, Wilfried Vandervorst, Conny Kenens, Twan Bearda, Guido Groeseneken, Ingrid Cornelissen, D. M Knotter, Sofie Mertens, Paul W. Mertens, Ivo Teerlinck, Marc Meuris, S. De Gendt, M.M. Heyns, Tanya Nigam, Lee M. Loewenstein, Robin Degraeve, Marc Schaekers, Rita Vos
Publikováno v:
IBM Journal of Research and Development. 43:339-350
Some recent findings in the area of wafer cleaning and thin oxide properties are presented in this paper. Results are shown for a practical implementation of a simplified cleaning concept that combines excellent performance in terms of metal and part
Autor:
S. De Gendt, Ingrid Cornelissen, F. De Smedt, Sophia Arnauts, M.M. Heyns, Gerald Stevens, Christiaan Vinckier, Marc Meuris
Publikováno v:
Journal of The Electrochemical Society. 146:1873-1878
A wet chemical procedure has been elaborated to measure the thickness of thin silicon dioxide layers. The procedure is based on the etching of the layer by HF and the determination of Si concentration in the microgram per liter range in the HF contai
Autor:
Stefan De Gendt, Marc Heyns, F. De Smedt, G. Gilis, Chris Vinckier, Ingrid Cornelissen, Marc Meuris
Publikováno v:
Solid State Phenomena. :81-84
Autor:
Marc Heyns, Marc Meuris, M. Wikol, K. Wolke, Ingrid Cornelissen, Geert Doumen, Lee M. Loewenstein
Publikováno v:
Solid State Phenomena. :77-80
Autor:
Stefan De Gendt, Ingrid Cornelissen, D. Martin Knotter, M. Meuris, Paul Mertens, Peter Snee, Rita Vos, Marc Heyns, Marcel Lux
Publikováno v:
Solid State Phenomena. :165-168
Autor:
S. De Gendt, M.M. Heyns, Paul W. Mertens, Ingrid Cornelissen, D. M Knotter, Rita Vos, Peter Snee, M. Lux
Publikováno v:
1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).
A novel, environmentally friendly process is successfully applied for the removal of photoresist and organic post-etch residues from silicon surfaces. The moist ozone gasphase process described, greatly increases the organic removal efficiency. Impro
Publikováno v:
van Lieshout, E & Cornelissen, I 1994, Teaching a complex counting procedure to improve mathematical word problem solving in children with learning deficiencies . in J E H van Luit (ed.), Research on learning and instruction of mathematics in kindergarten and primary school . Graviant, Doetinchem, pp. 296-302 .
Vrije Universiteit Amsterdam
Vrije Universiteit Amsterdam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::b573b9757fa4c5695710a5d947295844
https://research.vu.nl/en/publications/2d6ecc27-9945-4629-a236-e0015fa16cae
https://research.vu.nl/en/publications/2d6ecc27-9945-4629-a236-e0015fa16cae