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pro vyhledávání: '"Indira Sheshadri"'
Autor:
Krystelle Lionti, Teddie Magbitang, Martin Glodde, Anuja De Silva, Dario L. Goldfarb, Nelson Felix, Indira Sheshadri
Publikováno v:
SPIE Proceedings.
High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3720a8384ce7fe7f43e4a82ae2bd063
https://doi.org/10.1117/12.2257933
https://doi.org/10.1117/12.2257933
