Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Inbeom Yim"'
Autor:
Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno J. van Leest, Simon G. J. Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan N. Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a615ca4fc836a6d74b3192dd259fc1d
https://doi.org/10.1117/12.2658330
https://doi.org/10.1117/12.2658330
Autor:
Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seungyoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan N. Smith-Meerman, Stefan Van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::847a57fa8d28433369d8d4ee93e71e80
https://doi.org/10.1117/12.2658274
https://doi.org/10.1117/12.2658274
Autor:
Jenny Yueh, Miguel Garcia Granda, Seung-Bin Yang, Seung Yoon Lee, Elliott McNamara, Ewoud van West, Bart Segers, Yoon-Tae Lee, Se-Ra Jeon, Ali Ghavami, Yutao Gui, Joon-Soo Park, Daniel Park, Koshiba Dakeshi, Frank Staals, Jeongjin Lee, Chan Hwang, Inbeom Yim, Se-Hui Lee, Eric Janda
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
In order to meet the tightened lithography performance requirement for EUV systems, a good on-product focus control with accurate metrology is essential. In this manuscript we report on a novel metrology solution for the EUV on-product focus measurem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c15bb826d524b92a922ae00f30542136
https://doi.org/10.1117/12.2553246
https://doi.org/10.1117/12.2553246