Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Ilan A. Blech"'
Publikováno v:
Metallurgical and Materials Transactions A. 43:3411-3422
A paper, ‘‘The Microstructure of Rapidly Solidified Al6Mn,’’ [1] was submitted for publication in October 1984 by D. Shechtman and I. Blech to the Metallurgical Transactions A (now Metallurgical and Materials Transactions) after having been r
Publikováno v:
Journal of Applied Physics. 67:734-738
Thermal expansion coefficients and biaxial elastic moduli of the sputtered W, WNx, WSi0.45, and WSi0.67N0.10 thin films, used as refractory gate in the self‐aligned metal‐semiconductor field effect transistors on GaAs, were determined by insitu s
Publikováno v:
Journal of Applied Physics. 97:113525
Thin films deposited on wafers show, in some cases, large variations in stress. The local curvature is often used in the Stoney equation [G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909)] to calculate the local stress. This practice leads to
Autor:
Peter Wood, Ilan A. Blech
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:728-729
Diamondlike carbon films were deposited on silicon, gallium arsenide and aluminum substrates using ion‐assisted chemical vapor deposition. The stress of these films was measured as a function of temperature between 25 and 150 °C. Using the stress
Autor:
J.-D.T. Pan, Ilan A. Blech
Publikováno v:
Journal of Applied Physics. 55:2874-2880
The stress of thin film tantalum silicide, titanium silicide, and tungsten silicide was measured in situ during sintering. These refractory metal silicide films were cosputtered on oxidized silicon, quartz, and sapphire substrates. The films were hea
Publikováno v:
Journal of Applied Physics. 57:516-520
Recently, it has been shown that images can be formed in darkness by placing surfaces of silicon or other materials in contact with sensitive photographic films such as Ilford Nuclear Emulsion G5 or L4. These ‘‘chemographic’’ images are obser
Autor:
Eugene S. Meieran, Ilan A. Blech
Publikováno v:
Journal of Applied Physics. 36:3162-3167
Diffraction topographs of oxidized silicon wafers made by the extinction contrast technique show extremely high intensity being diffracted from the silicon surface directly under steps etched in the oxide. Edges of metal or dielectric films evaporate
Autor:
Ilan A. Blech, Eugene S. Meieran
Publikováno v:
Applied Physics Letters. 11:263-266
The process of electrotransport in Al thin films was directly observed by transmission electron microscopy. As expected, it was seen that hole formation occured in regions where the electron flow was in the direction of increasing temperature. Hilloc
Autor:
Ilan A. Blech, Eugene S. Meieran
Publikováno v:
Philosophical Magazine. 14:275-288
A reflection and transmission x-ray study of single crystal NiO was made below the Neel temperature. Anti-ferromagnetic domains separated by several types of twin boundaries were clearly observed. The indices of diffraction planes which must be used
Autor:
Ilan A. Blech, Eugene S. Meieran
Publikováno v:
Journal of Applied Physics. 38:3495-3508
X‐ray topographs of annealed Si web dendrite showed the presence of immense stacking faults lying parallel to the web surface. In all cases, the faults were bounded by 〈112〉 partial dislocations, which formed many unusual and complex dislocatio