Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Il Young Yoon"'
Autor:
Il-young Yoon
Publikováno v:
The Bukak History Academy. 11:275-309
Autor:
Seung-Hoon Choi, Melissa E. Kreider, Adam C. Nielander, Michaela Burke Stevens, Gaurav Ashish Kamat, Ja Eung Koo, Ki Ho Bae, Hoyoung Kim, Il Young Yoon, Bo Un Yoon, Kihyun Hwang, Dong Un Lee, Thomas F. Jaramillo
Publikováno v:
Applied Surface Science. 598:153767
Publikováno v:
Journal of the Korea Institute of Information and Communication Engineering. 17:2627-2635
In this paper micro-scale solar energy harvesting system with a new MPPT control are proposed. In conventional solar energy harvesting systems, continuous perturbation techniques of the clock frequency or duty cycle of a power converter have been use
Publikováno v:
Journal of Electronic Materials. 30:1560-1568
Test masks for characterizing pattern-dependent variation of the remained thickness after chemical-mechanical polishing (CMP) were designed by taking the experimentally obtained interaction distance into consideration. Polishing behaviors were charac
Autor:
Il Young Yoon, Young Bae Park
Publikováno v:
Metals and Materials International. 7:403-411
Test masks for characterizing pattern dependent variations in the thickness remaining after chemical-mechanical polishing (CMP) were designed taking the experimentally obtained interaction distance into consideration. Polishing behaviors were charact
Publikováno v:
Electrochemical and Solid-State Letters. 5:G19
Shallow trench isolation chemical mechanical polishing (CMP) using a conventional slurry has a number of problems such as variation of pattern density across the die, nonuniform polishing rate within wafer, and insufficient selectivity of oxide to ni
Autor:
Yong-kuk Jeong, Dong suk Shin, Kim, A., Il Young Yoon, Seo-woo Nam, Seung-jin Lee, Ki-kwan Park, Kim, K.C., Hong-jae Shin, Ki bong Roh, Ki-ho Kang, Yong-ho Choi, Gi-ho Seo, Kwon Lee, Kang soo Chu, Nae-in Lee
Publikováno v:
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.; 2006, p136-137, 2p