Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ikuo Matsukura"'
Autor:
Ikuo Matsukura, Yuichirou Ishibashi, Wataru Wakamiya, Iwao Higashikawa, Hiromasa Yamamoto, Naoko Shirota, Shinji Okada, Hironao Sasaki
Publikováno v:
Optical Microlithography XVIII.
Fluoropolymers have been successfully utilized for pellicle manufacturing in 248 and 193nm lithography. Moreover, the pellicle using such fluoropolymers will make a large contribution to the development of 193nm immersion technology that is now expec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a33a2acc65f83db7663a787ec898c416
https://doi.org/10.1117/12.599311
https://doi.org/10.1117/12.599311
Autor:
Fu-Chang Lo, Corey Foster, Florence Eschbach, Alex Tregub, Ikuo Matsukura, Nana Tsushima, Kevin J. Orvek
Publikováno v:
SPIE Proceedings.
Fluoropolymers were/are successfully used for pellicle manufacturing in 248 and 193 nm lithography. However, all known fluoropolymers rapidly degrade when exposed to high-energy 157 nm irradiation. Lack of suitable polymer “soft” pellicle has bec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a0f6afee9dc88bc4d54eaf238840e2c4
https://doi.org/10.1117/12.535446
https://doi.org/10.1117/12.535446
Publikováno v:
HETEROCYCLES. 23:287
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ebbbb5c296445f917f2d5a12219e067
https://doi.org/10.3987/r-1985-02-0287
https://doi.org/10.3987/r-1985-02-0287