Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Ijen van Mil"'
Autor:
Will Conley, G. G. Padmabandu, Yzzer Roman, Yingbo Zhao, Toufiq Aman, James Bonafede, Emmanuel Rausa, Rasmus Nielsen, Ijen van Mil, Rongkuo Zhao
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Wen Zhan Zhou, Kan Zhou, Yu Yang Bian, Yu Zhang, Ijen van Mil, Robbin Zhu, Jo Zhu, Ivan Mao, Kai yuan Chi, Xuechen Zhu, Kelvin Pao, Pei Wang, Lilla Wang, Abdalmohsen Elmalk, Gary Zhang
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Kan Zhou, Xin Guo, Yuyang Bian, Wenzhan Zhou, Yu Zhang, Ijen van Mil, Elly Shi, Robbin Zhu, Jo Zhu, Ivan Mao, Elvira Koolen, Kaiyuan Chi, Jose Carlos Font Trinchant, Gratiela Isai, Selena Chen, Jing Wang, Pei Wang, Shane Su, Xuechen Zhu, Kolos Lin, Kelvin Pao, Koen Thuijs, Peja Lee, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Andy Zhang, Leon Liang, Xander Wang, Gary Zhang
Publikováno v:
2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Autor:
Silvester Houweling, John Zimmerman, Laurens de Winters, Brian Blum, Juan Diego Arias Espinoza, Kamali Mohammad Reza, Yang Liu, Hans Meiling, Marco Reijnen, Joost de Hoogh, Nina Vladimirovna Dziomkina, Kursat Bal, Luigi Scaccabarozzi, Ijen van Mil, Carmen Zoldesi, Ronald Frank Kox, Henk Meijer, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Azeredo Lima Jorge Manuel, Derk Brouns, Robert de Kruif, Alain Kempa, Xiong Xugang, Guus Bock, Daniel Smith, Florian Didier Albin Dhalluin, Maarten Mathijs Marinus Jansen
Publikováno v:
Wood, O.R.Panning, E.M., Extreme Ultraviolet (EUV) Lithography V, 90481N-1-90481N-10
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::834bd6f420e0f7cc25eefca0c14b11bb
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19