Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Igor Matheus Petronella Aarts"'
Autor:
Igor Matheus Petronella Aarts, Robert John Socha, Chris de Ruiter, Manouk Rijpstra, Krishanu Shome, Sudhar Raghunathan, Jonathan Y. Lee, Leendertjan Karssemeijer, Jan Hermans, Boris Menchtchikov, Philippe Leray, Chumeng Zheng, Ralph Brinkhof, Floris Teeuwisse, Henry Megens, Chung-Tien Li, Irina Lyulina
Publikováno v:
Optical Microlithography XXXI
Three methods to minimize the impact of alignment mark asymmetry on overlay variation are demonstrated. These methods are measurement based optimal color weighting (OCW), simulation based optimal color weighting, and wafer alignment model mapping (WA
Autor:
Young Ha Kim, Haico Victor Kok, Byeong Soo Lee, Jeongjin Lee, Christopher J. Mason, Richard Droste, Young Seog Kang, Igor Matheus Petronella Aarts, Roelof de Graaf, Wim de Boeij, Hyunwoo Hwang, Bart Dinand Paarhuis, Jeong Heung Kong, Stefan Weichselbaum
Publikováno v:
SPIE Proceedings.
Overlay is one of the key factors which enables optical lithography extension to 1X node DRAM manufacturing. It is natural that accurate wafer alignment is a prerequisite for good device overlay. However, alignment failures or misalignments are commo
Autor:
Shawn Lee, Gijs ten Haaf, Henry Megens, Igor Matheus Petronella Aarts, Leendertjan Karssemeijer, Jan Mulkens, Daan Slotboom, Haico Victor Kok, Ralph Brinkhof, Evert Mos, Simon Reinald Huisman, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Manouk Rijpstra, Irina Lyulina, Robert John Socha, Boris Menchtchikov, Stefan Carolus Jacobus Antonius Keij, Wim Tjibbo Tel, Chris de Ruiter, Michael Kubis
Publikováno v:
Optical Microlithography XXXII
Multi-patterning lithography for future technology nodes in logic and memory are driving the allowed on-product overlay error in an DUV and EUV matched machine operation down to values of 2 nm and below. The ASML ORION alignment sensor provides an ef
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::783d1943d7337abc9346b91e2b12d413