Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Igor M. Chernev"'
Autor:
Hirofumi Hoshida, Naofumi Nishikawa (尚史西川), Nikolay G. Galkin, Andrey Gerasimenko, Igor M. Chernev, Yoshikazu Terai, Keisuke Ohdaira, Alexander V. Shevlyagin, Anton K. Gutakovskii
Publikováno v:
Solar Energy. 211:383-395
n-Mg2Si/p-Si heterojunction solar cell with a 1.4 µm thick unintentionally doped (n = 3 × 1017 cm−3) silicide epitaxial layer on p-Si(1 1 1) (p = 5 × 1014 cm−3) was grown by low temperature (250 °C) molecular beam epitaxy. Heterojunction demo
Autor:
Nikolay G. Galkin, Konstantin N. Galkin, Dmitrii L. Goroshko, Sergei A. Dotsenko, Oleg V. Kropachev, Igor M. Chernev, Evgenii Yu Subbotin, Aleksey Yu Alekseev, Dmitry B. Migas, Zsolt Fogarassy, Bela Pecz, Anton K. Gutakovskii
Publikováno v:
Japanese Journal of Applied Physics. 62:SD0803
Single-phase films of semiconductor and semimetallic calcium silicides (Ca2Si, CaSi, and CaSi2), as well as films with a significant contribution of Ca5Si3 and Ca14Si19 silicides, were grown on single-crystal silicon and sapphire substrates. The anal
Autor:
Igor M. Chernev, E.A. Chusovitin, A.A. Usenko, Vladimir Khovaylo, D. L. Goroshko, Konstantin N. Galkin, Nikolay G. Galkin, Alexander V. Shevlyagin
Publikováno v:
Defect and Diffusion Forum. 386:3-8
The growth, structure, optical, electrical and thermoelectric properties of calcium silicides of various compositions on silicon substrates with (100) and (111) orientations were experimentally studied. It was found that when the atoms of Ca and Si a
Autor:
Igor M. Chernev, Béla Pécz, Andrea Németh, Konstantin N. Galkin, Zoltán Osváth, László Dózsa, Zs. Zolnai, S.A. Dotsenko, N. G. Galkin
Publikováno v:
Applied Surface Science. 405:111-118
Thin un-doped and Al doped polycrystalline Mg-stannide films consisting mainly of Mg 2 Sn semiconductor phase have been grown by deposition of Sn-Mg multilayers on Si(111) p-type wafers at room temperature and annealing at 150 °C. Rutherford backsca
Autor:
A. Yu. Ustinov, A. M. Maslov, S. A. Dotsenko, S. A. Kitan, Alexander V. Shevlyagin, Andrey V. Gerasimenko, A. S. Gouralnik, E. A. Koblova, Igor M. Chernev, N. G. Galkin, Konstantin N. Galkin, V. M. Il'yashenko
Publikováno v:
Applied Surface Science. 439:282-284
Autor:
Anton K. Gutakovskii, Alexander Yu. Ustinov, Alexander V. Shevlyagin, Alexander S. Gouralnik, Igor M. Chernev, Andrey V. Gerasimenko
Publikováno v:
Materials Chemistry and Physics. 258:123903
Mg2Si films have been grown on Si(111) and Si(001) surfaces at ~ 387–477 °C by ultra-fast deposition in vacuum. The original pulse-type evaporator used allows Mg deposition rates of ~103–104 nm/s which provide effective accumulation of Mg on hot
Autor:
Igor M. Chernev, Yuri N. Kulchin, Dmitrii S. Yatsko, E. P. Subbotin, Konstantin N. Galkin, Nikolay G. Galkin, E.A. Chusovitin
Publikováno v:
Solid State Phenomena. 247:158-167
Investigations of crystal structure, microstructure and composition of laser welded coatings of bronze, IN625, PGSR-4 and stainless steel alloys on non-magnetic substrates have shown that from the raw alloy powders (wire) the additional crystalline p
Publikováno v:
Solid State Phenomena. 247:66-72
Thin Mg2Ge films were grown using two methods: a co-deposition of Ge and Mg on Si substrate kept at room temperature followed by annealing at 200 °C (solid phase epitaxy – SPE) and reactive deposition epitaxy (RDE) of Ge and Mg on Si at 200 °C. O
Autor:
Igor M. Chernev, Nikolay G. Galkin, D. L. Goroshko, E.A. Chusovitin, Konstantin N. Galkin, Alexander V. Shevlyagin
Publikováno v:
Solid State Phenomena. 247:61-65
An array of GaSb nanocrystallites (NCs) was formed on Si(001) substrate by solid-phase epitaxy at 500 °C. Owing to the embedded GaSb NCs, p+‑Si/NC‑GaSb/n‑Si mesa diode spectral sensitivity has extended up to 1.6 µm at room temperature, and it
Autor:
Igor M. Chernev, Alexander V. Shevlyagin, E.A. Chusovitin, Nikolay G. Galkin, Konstantin N. Galkin, D. L. Goroshko
Publikováno v:
Solid State Phenomena. 245:72-79
Formation of GaSb by means of solid phase epitaxy of amorphous Ga:Sb (1:1) layer on Si (001) substrate at 500 °C has been studied. At amorphous layer thickness of 16 nm, a continuous nanocrystalline layer of GaSb was formed. Decreasing of amorphous