Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Ichitaro Waki"'
Publikováno v:
Chemistry Letters. 47:436-439
Solar methane generation was demonstrated using a GDE loaded with Cu and Ag as a cathode, and a CoPi/BiVO4:Mo film as a photoanode combined with a CIS-PV. Instead of using dissolved CO2 in a solution, gas-phase CO2 was utilized by directly flowing it
A Stand‐Alone Module for Solar‐Driven H 2 Production Coupled with Redox‐Mediated Sulfide Remediation
Autor:
Kazuhiro Takanabe, Shinichi Tanabe, Ichitaro Waki, Kazuhiro Ohkawa, Konstantinos Kotsovos, Keisuke Obata, Yuuki Shinohara
Publikováno v:
Energy Technology. 7:1900575
Autor:
Masakazu Sugiyama, Yoshiaki Nakano, Hassanet Sodabanlu, Ichitaro Waki, Jung-Seung Yang, Yukihiro Shimogaki
Publikováno v:
Journal of Crystal Growth. 311:383-388
The pulse injection (PI) growth method in which trimethylaluminium (TMAl) and NH 3 are alternately supplied was used to grow AlN layer at 800 °C. It was found that the process parameters in the PI method such as TMAl supply time ( τ TMAl ), TMAl pa
Autor:
Aurelian David, Rajat Sharma, Ichitaro Waki, Claude Weisbuch, Shuji Nakamura, P. Morgan Pattison
Publikováno v:
physica status solidi (a). 203:1783-1786
A gallium nitride based micro-cavity light emitting diode emitting at a peak wavelength of 498 nm has been fabricated. The epitaxial structure was grown by metalorganic chemical vapor deposition, and the device was fabricated using a laser lift-off p
Publikováno v:
Japanese Journal of Applied Physics. 45:720-723
Inductively coupled plasma (ICP) dry etching of metalorganic chemical vapor deposition-grown Ga-face and N-face GaN was performed under various etching conditions. Unlike wet etching, etch rates of the N-face GaN were close to those of the Ga-face Ga
Autor:
Ichitaro Waki, Foo Cheong Yit, Abdullah Al Amin, Xueliang Song, Masakazu Sugiyama, Kenji Sakurai, Yukihiro Shimogaki, Yoshiaki Nakano, Ning Li
Publikováno v:
Shinku. 48:511-518
Autor:
Ichitaro Waki, Jung-Seung Yang, Hassanet Sodabanlu, Masakazu Sugiyama, Yukihiro Shimogaki, Yoshiaki Nakano
Publikováno v:
Japanese Journal of Applied Physics. 46:L927-L929
High quality AlN layer could be grown at 800 °C by metal organic vapor phase epitaxy (MOVPE) by pulse injection (PI) method in which trimethylaluminium (TMAl) and NH3 are alternately supplied. Crystal quality of AlN layer grown by PI method (PI-AlN)
Publikováno v:
Applied Physics Letters. 82:4465-4467
Two-hundred-period high-quality AlN/GaN multiple quantum wells (MQWs) grown by metalorganic vapor phase epitaxy are studied using high-resolution x-ray diffraction, transmission electron microscopy, and optical transmission spectroscopy. Excellent in
Publikováno v:
physica status solidi (b). 228:391-393
The activation of metalorganic chemical vapor deposition (MOCVD)-grown Mg-doped GaN by N 2 annealing with thin Pd films has been investigated, p-type GaN with a hole concentration of 7 x 10 16 cm -3 has been obtained at an annealing temperature as lo
Autor:
Masakazu Sugiyama, H. Otani, Yoshiaki Nakano, Ning Li, Ichitaro Waki, Chaiyasit Kumtornkittikul
Publikováno v:
The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004..
We propose waveguide structures for ultrafast optical devices utilizing intersubband absorption in GaN-based multiple quantum wells grown with metalorganic vapor phase epitaxy. The proposed structure can efficiently enhance absorption in the GaN/AlN