Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Ichiki Takemoto"'
Autor:
Nobuo Ando, Kazuhiko Hashimoto, Junji Funase, Kunishige Edamatsu, Ichiki Takemoto, Hiroyuki Yokoyama, Yusuke Fuji
Publikováno v:
Journal of Photopolymer Science and Technology. 20:473-480
Our recent research effort has been focused on new top coating-free 193nm immersion resists with regard to leaching of the resist components and lithographic performance. We have examined methacrylate-based resins that control the surface properties
Autor:
Youngjoon Lee, Ichiki Takemoto, Shinji Konishi, Isao Yoshida, Yusuke Fuji, Satoshi Yamaguchi, Kazuhiko Hashimoto, Kenji Takahashi, Takayuki Miyagawa
Publikováno v:
Journal of Photopolymer Science and Technology. 18:399-406
Autor:
Masayuki Takashima, Ichiki Takemoto, Youngjoon Lee, Nobuo Ando, Hiroyuki Yokoyama, Kunishige Edamatsu
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Extreme ultraviolet lithography at a wavelength of 13.5 nm has been prepared for next generation lithography for several years. Of primary concern in EUV lithography is line edge roughness as well as high sensitivity. In recent years, various types o
Autor:
Kunishige Edamatsu, Nobuo Ando, Hiroyuki Yokoyama, Ichiki Takemoto, Junji Funase, Yusuke Fuji, Kazuhiko Hashimoto, Koji Kuwana
Publikováno v:
SPIE Proceedings.
Our recent research effort has been focused on new top coating-free 193nm immersion resists with regard to leaching of the resist components and lithographic performance. We have examined methacrylate-based resins that control the surface properties
Autor:
Katsushi Nakano, Shinji Konishi, Youngjoon Lee, Ichiki Takemoto, Nobuo Ando, Satoshi Yamamoto, Fujiwara Tomoharu, Takayuki Miyagawa, Yoshinobu Tsuchida, Kunishige Edamatsu, Keiko Yamamoto
Publikováno v:
SPIE Proceedings.
With no apparent showstopper in sight, the adoption of ArF immersion technology into device mass production is not a matter of 'if' but a matter of 'when'. As the technology matures at an unprecedented speed, many of initial technical difficulties ha
Autor:
Youngjoon Lee, Ichiki Takemoto, Satoshi Yamaguchi, Isao Yoshida, Shinji Konishi, Kenji Takahashi, Takayuki Miyagawa, Yusuke Fuji, Kazuhiko Hashimoto
Publikováno v:
SPIE Proceedings.
Numerous resolution enhancement techniques have been introduced over the past few years as the design rule decreases rapidly. Among them are thermal reflow, SAFIER and RELACS just to name a few. Resist reflow is one of the simplest processes with a m
Publikováno v:
SPIE Proceedings.
We compared 2MAdMA(2-Metyl-2- Adamantylmethacrylate)/GBLMA((gamma) -butyrolactone methacrylate) resin system and 2EAdMA(2-Etyl-2- Adamantylmethacrylate)/GBLMA resin system. 2EAdMA/GBLMA resin system showed higher sensitivity, dissolution contrast and
Publikováno v:
SPIE Proceedings.
Alicyclic groups are preferable resin components of ArF resists due to better dry-etching resistance and higher transparency at 193 nm. On the other hand, Alicyclic groups bring poor adhesion of ArF resists during wet development, because of their hi
Publikováno v:
Bioscience, Biotechnology, and Biochemistry. 58:2071-2072
Homogeneous hydrogenation of 2-phenyl-3-methyl-2-butenoic acid derivatives in the presence of a catalytic amount of such chiral phosphine-rhodium complexes as Rh/(R)-BINAP, Rh/(R)-, or (S)-Cy-BINAP, Rh/(R)-p-tolyl-BINAP, and Rh/(R)-p-methoxy-phenyl-B
Publikováno v:
Bioscience, Biotechnology, and Biochemistry. 58:788-789
Syntheses of a fluorobenzoxazine derivative, fluorobenzothiazine derivative and fluoroquinoxaline derivative are described. These compounds were synthesized by reductive cyclization of the corresponding fluorodinitrobenzene derivatives. The fluoroben