Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ian Roger Oliver"'
Autor:
Jerzy R. Hoffman, William N. Partlo, Stephan T. Melnychuk, Richard M. Ness, Igor V. Fomenkov, Oleg Khodykin, Norbert R. Bowering, Curtis L. Rettig, Ian Roger Oliver
Publikováno v:
Journal of Physics D: Applied Physics. 37:3266-3276
The application of a dense plasma focus pinch discharge as a light source for extreme ultraviolet (EUV) lithography is discussed. For operation with xenon gas, the radiation emitted at around 13.5 nm is analysed with temporal, spectral or spatial res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed50b9e3fd94da9a829f89592d46a40f
https://doi.org/10.1088/0022-3727/37/23/007
https://doi.org/10.1088/0022-3727/37/23/007
Autor:
Richard M. Ness, Jerzy R. Hoffman, Oleg Khodykin, Curtis L. Rettig, William N. Partlo, Stephan T. Melnychuk, Igor V. Fomenkov, Ian Roger Oliver, Norbert R. Bowering
With the emergence of EUVL as the chosen technology for next-generation lithography (NGL) systems, significant effort has been spent in developing light sources consistent with the challenging requirements of the scanner manufacturers as well as meet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b92ffeec333c32adcd805185ad48db2
https://doi.org/10.1117/3.613774.ch12
https://doi.org/10.1117/3.613774.ch12
Autor:
Oleh V. Khodykin, Norbert R. Bowering, Igor V. Fomenkov, Jerzy R. Hoffman, Curtis L. Rettig, Richard M. Ness, Ian Roger Oliver, Stephan T. Melnychuk
Publikováno v:
SPIE Proceedings.
A commercially viable light source for EUV lithography has to meet the large set of requirements of a High Volume Manufacturing (HVM) lithography tool. High optical output power, high-repetition rate, long component lifetime, good source stability, a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::20d0fc2730378d1422339c32e9a7f5c7
https://doi.org/10.1117/12.538690
https://doi.org/10.1117/12.538690
Autor:
Igor V. Fomenkov, Richard M. Ness, William N. Partlo, Stephan T. Melnychuk, Oleh V. Khodykin, Norbert R. Boewering, Ian Roger Oliver
Publikováno v:
Emerging Lithographic Technologies VI.
Since the initial demonstration of EUV emission with Xenon as a source gas in Cymer's Dense Plasma Focus (DPF) device, significant effort has been spent exploring the parameter space for optimization of efficient generation of EUV radiation. Paramete
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6df98282763e6565c61a3d5cab913bbb
https://doi.org/10.1117/12.472339
https://doi.org/10.1117/12.472339
Autor:
John E. Rauch, Richard M. Ness, William N. Partlo, Igor V. Fomenkov, Ian Roger Oliver, Stephan T. Melnychuk
Publikováno v:
SPIE Proceedings.
Recent advances in the Dense Plasma Focus (DPR) under investigation by Cymer as an EUV light source have increased both the total energy storage capacity and the peak drive current. Previous generation DPF tools built by Cymer produced no measurable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21d426207799ea4e6ed89a6ec2359612
https://doi.org/10.1117/12.436653
https://doi.org/10.1117/12.436653
Publikováno v:
SPIE Proceedings.
Initial characterization efforts of Dense Plasma Focus (DPF) technology showed that efficient conversion of electrical energy into in-band emitted radiation could be achieved. Results previously reported showed that 25 J of electrical energy can be c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9485d4bf44c9b44f46cba332ea2882e6
https://doi.org/10.1117/12.390041
https://doi.org/10.1117/12.390041