Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Ian M. Mcmackin"'
Autor:
Jonathan K. Wassei, Oliver Seitz, Mukti Aryal, Ian M. Mcmackin, Joseph B. Geddes, Boris Kobrin
Publikováno v:
SID Symposium Digest of Technical Papers. 45:194-196
We report on a recently developed superior ITO-alternative transparent conductor, based on metal mesh technology. Trademarked by Rolith, Inc as NanoWeb®, metal mesh has the narrowest lines on the market (< 1 micron), which assures complete invisibil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15e4bb5bdf94a18746e253d455e2785e
https://doi.org/10.1002/j.2168-0159.2014.tb00053.x
https://doi.org/10.1002/j.2168-0159.2014.tb00053.x
Autor:
Mukti Aryal, Joseph B. Geddes, Boris Kobrin, Ian M. Mcmackin, Joseph Perez, Jonathan K. Wassei, Oliver Seitz
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII.
A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dcfbf939893fadca072fe12612dc9d7c
https://doi.org/10.1117/12.2037415
https://doi.org/10.1117/12.2037415
Autor:
Ian M. Mcmackin, Ecron Thompson, Peter Dress, Sherjang Singh, Uwe Dietze, Douglas J. Resnick, Ssuwei Chen, Brian Fletcher, Kosta Selinidis
Publikováno v:
Alternative Lithographic Technologies.
Step-and-Flash Imprint Lithography (S-FIL) is a promising lithography strategy for semiconductor manufacturing at device nodes below 32nm. The S-FIL 1:1 pattern transfer technology utilizes a field-by-field ink jet dispense of a low viscosity liquid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dee4698e33a36b9f99e9077d9a0ad382
https://doi.org/10.1117/12.814290
https://doi.org/10.1117/12.814290
Autor:
Ecron Thompson, Douglas J. Resnick, Joseph Perez, Kosta Selinidis, Sidlgata V. Sreenivasan, Ian M. Mcmackin
Publikováno v:
Photomask Technology 2008.
Step and Flash Imprint Lithography redefines nanoimprinting. This novel technique involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f70972c1c26e2a5f4a528f2c5a46599a
https://doi.org/10.1117/12.801948
https://doi.org/10.1117/12.801948
Autor:
Ecron Thompson, Douglas J. Resnick, Toshiaki Hasebe, Tadashi Kitamura, Eric S. Ainley, William J. Dauksher, L. Jeff Myron, Kevin J. Nordquist, Shinichi Nakazawa, Toshifumi Tokumoto, Ian M. Mcmackin
Publikováno v:
SPIE Proceedings.
Imprint lithography has been included on the ITRS Lithography Roadmap at the 32 and 22 nm nodes. Step and Flash Imprint Lithography (S-FIL ) is a unique method for printing sub-100 nm geometries. Relative to other imprinting processes S-FIL has the a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0baac4077913b0f5477eecbdbd715b3c
https://doi.org/10.1117/12.659457
https://doi.org/10.1117/12.659457
Autor:
C. Grant Willson, Jin Choi, Daniel A. Babbs, Van N. Truskett, Sidlgata V. Sreenivasan, Frank Y. Xu, Michael Watts, Ecron Thompson, Ian M. Mcmackin, Norman E. Schumaker, Nicholas A. Stacey, Philip D. Schumaker
Publikováno v:
SPIE Proceedings.
The Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. This talk wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba7a506347acc374ab20333e6eb084d7
https://doi.org/10.1117/12.538734
https://doi.org/10.1117/12.538734
Autor:
Sidlgata V. Sreenivasan, Philip D. Schumaker, Norman E. Schumaker, Van Nguyen, Daniel A. Babbs, Jin Choi, Ian M. Mcmackin, Michael Watts, Frank Y. Xu, Ecron Thompson
Publikováno v:
SPIE Proceedings.
Step and FlashTM Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4543be028ff5598d11aee509ab5e121
https://doi.org/10.1117/12.538733
https://doi.org/10.1117/12.538733
Autor:
Michael Watts, P. Schumaker, Sidlgata V. Sreenivasan, Frank Y. Xu, Jessica Y. Choi, Daniel A. Babbs, Norman E. Schumaker, Van Nguyen, Ian M. Mcmackin
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.
The Step and Flash/sup TM/ Imprint Lithography (S-FIL/sup TM/) process is a step and repeat nanoreplication technique based on UV curable low viscosity liquids. This article discusses various process capability of S-FIL including imprint resolution a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f2aa651950fba85b98cef51f5acec2f
https://doi.org/10.1109/imnc.2003.1268613
https://doi.org/10.1109/imnc.2003.1268613
Autor:
William J. Dauksher, Kevin J. Nordquist, David P. Mancini, Kathleen A. Gehoski, Douglas J. Resnick, Ian M. Mcmackin, Philip D. Schumaker
Publikováno v:
SPIE Proceedings.
Step and FLash Imprint Lithography (S-FIL) is one of several new methods of imprint lithography being actively developed. Since S-FIL is a 1X printing technique, fabrication of templates is especially critical. The requirement to produce defect-free
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::625f7bd52a6a3d18b8cf2dc12dea0054
https://doi.org/10.1117/12.518307
https://doi.org/10.1117/12.518307
Autor:
Philip D. Schumaker, Ian M. Mcmackin, David P. Mancini, Douglas J. Resnick, Kevin J. Nordquist, Kathleen A. Gehoski, William J. Dauksher
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is one of several new nano-imprint techniques being actively developed. While SFIL has been shown to be capable of sub-30 nm resolution, critical dimension (CD) control of imprinted features must be demonstra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edc46c5ee0f782c25f6353d0ee0c8d65
https://doi.org/10.1117/12.484923
https://doi.org/10.1117/12.484923