Zobrazeno 1 - 10
of 236
pro vyhledávání: '"Ian D Sharp"'
Autor:
Bianca Scaparra, Akhil Ajay, Pavel S Avdienko, Yuyang Xue, Hubert Riedl, Paul Kohl, Björn Jonas, Beatrice Costa, Elise Sirotti, Paul Schmiedeke, Viviana Villafañe, Ian D Sharp, Eugenio Zallo, Gregor Koblmüller, Jonathan J Finley, Kai Müller
Publikováno v:
Materials for Quantum Technology, Vol 3, Iss 3, p 035004 (2023)
In recent years, there has been a significant increase in interest in tuning the emission wavelength of InAs quantum dots (QDs) to wavelengths compatible with the already existing silica fiber networks. In this work, we develop and explore compositio
Externí odkaz:
https://doaj.org/article/b0ff0ef1929d4a6bbf3a251db3d5e553
Publikováno v:
Advanced Materials Interfaces, Vol 11, Iss 22, Pp n/a-n/a (2024)
Abstract Zinc nitride (Zn3N2) is a promising semiconductor for a range of optoelectronic and energy conversion applications, offering a direct bandgap of 1.0 eV, large carrier mobilities, and abundant constituent elements. However, the material is pr
Externí odkaz:
https://doaj.org/article/f7c976b92c214bcea4333a2c2735b11b
Autor:
Chao Feng, Faze Wang, Zhi Liu, Mamiko Nakabayashi, Yequan Xiao, Qiugui Zeng, Jie Fu, Qianbao Wu, Chunhua Cui, Yifan Han, Naoya Shibata, Kazunari Domen, Ian D. Sharp, Yanbo Li
Publikováno v:
Nature Communications, Vol 12, Iss 1, Pp 1-10 (2021)
While self-healing catalysts may survive the harsh environments used for oxygen evolution, understanding how to develop such electrocatalysts remains a challenge. Here, authors find cobalt to promote the self-healing of leached iron centers in borate
Externí odkaz:
https://doaj.org/article/69a988436a45475c9b1711d321ea25e1
Autor:
Pan Ding, Hongyu An, Philipp Zellner, Tianfu Guan, Jianyong Gao, Peter Müller-Buschbaum, Bert M. Weckhuysen, Ward van der Stam, Ian D. Sharp
Publikováno v:
ACS Catalysis. 13:5336-5347
Nafion ionomer, composed of hydrophobic perfluorocarbon backbones and hydrophilic sulfonic acid side chains, is the most widely used additive for preparing catalyst layers (CLs) for electrochemical CO2 reduction, but its impact on the performance of
Publikováno v:
Chemical Science. 14:1097-1104
This work highlights the importance of a direct contact between the CO-generating molecular catalyst and the Cu catalyst to promote C–C coupling in tandem electrocatalytic CO2 reduction.
Autor:
Theresa Grünleitner, Alex Henning, Michele Bissolo, Marisa Zengerle, Luca Gregoratti, Matteo Amati, Patrick Zeller, Johanna Eichhorn, Andreas V. Stier, Alexander W. Holleitner, Jonathan J. Finley, Ian D. Sharp
Publikováno v:
ACS Nano. 16:20364-20375
Autor:
Johanna Eichhorn, Christoph Kastl, Jason K. Cooper, Dominik Ziegler, Adam M. Schwartzberg, Ian D. Sharp, Francesca M. Toma
Publikováno v:
Nature Communications, Vol 9, Iss 1, Pp 1-8 (2018)
The performance of energy materials is affected by structural defects, as well as physicochemical heterogeneity over different length scales. Here the authors map nanoscale correlations between morphological and functional heterogeneity, quantifying
Externí odkaz:
https://doaj.org/article/d4ad5989756e4c4eb02131b789d9247a
Autor:
Alex Henning, Sergej Levashov, Chenjiang Qian, Theresa Grünleitner, Julian Primbs, Jonathan J. Finley, Ian D. Sharp
Publikováno v:
Advanced Materials Interfaces. 10
Autor:
Alex Henning, Johannes D. Bartl, Lukas Wolz, Maximilian Christis, Felix Rauh, Michele Bissolo, Theresa Grünleitner, Johanna Eichhorn, Patrick Zeller, Matteo Amati, Luca Gregoratti, Jonathan J. Finley, Bernhard Rieger, Martin Stutzmann, Ian D. Sharp
Publikováno v:
Advanced Materials Interfaces
Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on reproducible and scalable processes for interface manipulation of 3D structured surfaces on the atomic scale. While ALD
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c39299ab8169dfb89f00d91c078db038
https://hdl.handle.net/21.11116/0000-000C-F84C-821.11116/0000-000C-3C1F-0
https://hdl.handle.net/21.11116/0000-000C-F84C-821.11116/0000-000C-3C1F-0
Autor:
Yuqin Zou, Shuai Yuan, Ali Buyruk, Johanna Eichhorn, Shanshan Yin, Manuel A. Reus, Tianxiao Xiao, Shambhavi Pratap, Suzhe Liang, Christian L. Weindl, Wei Chen, Cheng Mu, Ian D. Sharp, Tayebeh Ameri, Matthias Schwartzkopf, Stephan V. Roth, Peter Müller-Buschbaum
Publikováno v:
ACS Applied Materials & Interfaces. 14:2958-2967