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Autor:
Dave H. A. Blank, Sankhanilay Roy Chowdhury, J. Sekulic, Cees J.M. van Rijn, Albert van den Berg, Johan E. ten Elshof, Klaas Keizer, Riaan Schmuhl
Publikováno v:
Advanced materials, 16(11), 900-904. Wiley-Blackwell
A new class of porous oxide interconnects with a regularly perforated SiN support structure is presented here. The method is demonstrated by constructing -alumina, MCM-48 silica (see Figure), and amorphous titania interconnects. Ionic transport throu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7d73a2589bd586f37c7b303f6044d569
https://research.utwente.nl/en/publications/f8b44481-3dc5-4162-9d73-2c8dcc40e26d
https://research.utwente.nl/en/publications/f8b44481-3dc5-4162-9d73-2c8dcc40e26d
