Zobrazeno 1 - 10
of 60
pro vyhledávání: '"INDUSTRIAL plasma chemistry"'
Autor:
Kiehlbauch, Mark W., Graves, David B.
Publikováno v:
Journal of Applied Physics. 2/15/2001, Vol. 89 Issue 4, p2047. 11p. 1 Diagram, 2 Charts, 13 Graphs.
Autor:
Marinov, Daniil, de Marneffe, Jean-François, Smets, Quentin, Arutchelvan, Goutham, Bal, Kristof M., Voronina, Ekaterina, Rakhimova, Tatyana, Mankelevich, Yuri, El Kazzi, Salim, Nalin Mehta, Ankit, Wyndaele, Pieter-Jan, Heyne, Markus Hartmut, Zhang, Jianran, With, Patrick C., Banerjee, Sreetama, Neyts, Erik C., Asselberghs, Inge, Lin, Dennis, De Gendt, Stefan
Publikováno v:
NPJ 2D Materials & Applications; 1/28/2021, Vol. 5 Issue 1, p1-10, 10p
Autor:
Jin, Su B.1 jinsubong@skku.edu, Lee, Joon S.1, Choi, Yoon S.1, Choi, In S.1, Han, Jeon G.1, Hori, M.2
Publikováno v:
Thin Solid Films. Nov2013, Vol. 547, p193-197. 5p.
Publikováno v:
Catalysis Today. Aug2013, Vol. 211, p9-28. 20p.
Publikováno v:
Environmental Science & Technology. 6/18/2013, Vol. 47 Issue 12, p6478-6485. 8p.
Autor:
Yan-hong Bai1,2 yhbai7@mail.xjtu.edu.cn, Jie-rong Chen3 jrchen@mail.xjtu.edu.cn, Xiao-yong Li, Chun-hong Zhang
Publikováno v:
Reviews of Environmental Contamination & Toxicology. 2009, Vol. 201, p117-136. 20p. 1 Chart.
Publikováno v:
Journal of Microwave Power & Electromagnetic Energy; Mar2017, Vol. 51 Issue 1, p43-58, 16p
Publikováno v:
AIChE Journal; Mar2015, Vol. 61 Issue 3, p913-921, 9p
Publikováno v:
IEEE Transactions on Plasma Science; Dec2014 Part 1, Vol. 42 Issue 12, p3722-3725, 4p
Publikováno v:
Journal of Physics D: Applied Physics; 11/20/2013, Vol. 46 Issue 46, p464017-464023, 7p