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Autor:
Keping Yan, van Ejm Bert Heesch, Ajm Guus Pemen, SA Sreejit Nair, S.V. Korotkov, I.V. Grekhov
Publikováno v:
Review of Scientific Instruments, 74(10), 4361-4365. American Institute of Physics
Pulsed plasma techniques serve a wide range of unconventional processes, such as gas and water processing, hydrogen production, and nanotechnology. Extending research on promising applications, such as pulsed corona processing, depends to a great ext
Publikováno v:
Cryogenics. 38:613-618
We demonstrate for the first time the capability of tunnel MOS emitter transistors to operate in the temperature range from 300 K down to 4.2 K without reduction of current gain. This device suffers much less from carrier freeze out than conventional
Autor:
V. P. Tarakanov, A.P. Milyaev, E. F. Lebedev, A. V. Ul’yanov, I.V. Grekhov, V. M. Fedorov, V. E. Ostashev
Publikováno v:
2007 7th International Symposium on Electromagnetic Compatibility and Electromagnetic Ecology.
The high power ultra wide-band (UWB) radiators for the electromagnetic video-pulses built as assemblies by radiating modules. Each module is contained the UWB radiating antenna of a TEM-horn type and the high voltage up to 50 kV sub-nanosecond pulse
Autor:
L.S. Kostina, T.V. Kudravtzeva, E.I. Beliakova, E. D. Kim, I.V. Grekhov, S. C. Kim, J.M. Park, L. S. Berman
Publikováno v:
1996 54th Annual Device Research Conference Digest.
We have proposed a novel modification of silicon direct bonding (SDB) technique dealing with silicon wafers joined in such a way that a smooth surface of one wafer is attached to the grooved surface of the other. This paper presents some experimental
Publikováno v:
Proceedings of the 6th International Symposium on Power Semiconductor Devices and Ics.
Silicon Direct Bonding (SDB) technique has been used for designing GTO with a double-layer p-base in which a net of highly doped stripes was made at the interface between the two p-type layers. The device provides a-higher (by an order of magnitude o
Publikováno v:
Scopus-Elsevier
Summarizes results on optimisation of parameters of Al/SiO/sub 2//n-Si tunnel structures for different device applications. The most promising device is an Auger transistor-a bipolar transistor with tunnel MIS emitter (hot electron injector) and inve
Publikováno v:
Solid State Communications. 87:341-343
This article presents the analysis of the static characteristics of Si metal-insulator-semiconductor tunnel emitter Auger transistor. This study shows that there are some sharp rises of the differential current gain as a function of base-to-emitter v