Zobrazeno 1 - 5
of 5
pro vyhledávání: '"I. Traus"'
Publikováno v:
Diamond and Related Materials. 7:1333-1337
The most common method for the deposition of DLC films is radio frequency PACVD (rf, 13.56 MHz), which is technically difficult and expensive to scale up to industrial dimensions. Alternative methods are direct current (DC) or medium frequency (mf) p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::283d9013f98b8d4d676b6497d393cccb
https://doi.org/10.1016/s0925-9635(98)00203-9
https://doi.org/10.1016/s0925-9635(98)00203-9
Publikováno v:
Plasma Chemistry and Plasma Processing. 13:77-91
The dissociation of hydrogen sulfide has been studied in an atmospheric-pressure glow discharge rotating between concentric electrodes in an axial magnetic field. Though the electrodes were heated to remove the sulfur formed in the discharge, stable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3386a140001f93bc154c678f0edfa5e
https://doi.org/10.1007/bf01447171
https://doi.org/10.1007/bf01447171
Autor:
I. Traus, Harald Suhr
Publikováno v:
Plasma Chemistry and Plasma Processing. 12:275-285
A high-temperature ozonizer device has been developed to stud v the conversion of hydrogen sulfide (H2S) into elemental sulfur and hydrogen. To allow for continuous operation, the process must be carried out at temperatures high enough to remove the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9e16d647106265969d8a7734b3842a6
https://doi.org/10.1007/bf01447026
https://doi.org/10.1007/bf01447026
For engineering applications, diamond-like carbon films (DLC) are the most suitable coatings, when high wear-resistance and low friction is needed. One problem is their very poor adhesion to steel substrates when no intermediate layer is supplied. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8306b65766f7c91c072ad232c54116cd
https://publica.fraunhofer.de/handle/publica/192353
https://publica.fraunhofer.de/handle/publica/192353
Autor:
H. Grünwald, Harald Suhr, H. Wendel, E. Feurer, A. Etspüler, A. Weber, S. Reich, J. Bald, Helga Holzschuh, Lutz Deutschmann, Christa Dipl Chem Dr Haag, I. Traus, Christian Oehr, B. Waimer, R. Schmid
Publikováno v:
Le Journal de Physique Colloques. 50:C5-739
About 50 organometallic compounds have been tested as precursors in the plasma-enhanced chemical vapour deposition (PECVD) of metallic and oxidic films. The classes of compounds which are best suited for the deposition are described. Experimental tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f966f798c46c378dcef98ccaa2defa4
https://doi.org/10.1051/jphyscol:1989589
https://doi.org/10.1051/jphyscol:1989589