Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

Autor: M. J. Jurek, Elsa Reichmanis, A. E. Novembre, I. P. Heyward, R. Gooden

Publikováno v: Chemistry of Materials. 1:509-514

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cc6928313a1d6e5ee48d97f1b2b621f6
https://doi.org/10.1021/cm00005a009

Polymer Stabilization and Degradation

Autor: PETER P. KLEMCHUK, E. G. ROZANTSEV, E. SH. KAGAN, V. D. SHOLLE, V. B. IVANOV, V. A. SMIRNOV, TOSHIMASA TODA, TOMOYUKI KURUMADA, KEISUKE MURAYAMA, HELMUT K. MÜLLER, B. N. FELDER, E. T. DENISOV, J. T. LAI, P. N. SON, E. JENNINGS, R. W. LAYER, R. P. LATTIMER, J. C. WESTFAHL, T. KELEN, F. TÜDŐS, G. BÁLINT, A. ROCKENBAUER, JOHN L. GERLOCK, DAVID R. BAUER, LINDA M. BRIGGS, ROBERT J. TUCKER, PETER V. SUSI, C. E. RAMEY, C. J. ROSTEK, JAN POSPISIL, GERALD SCOTT, OTTO VOGL, ANN CHRISTINE ALBERTSSON, ZVONIMIR JANOVIC, A. C. SOMERSALL, J. E. GUILLET, PAUL-LI HORNG, JOHN D. SPIVACK, STEPHEN D. PASTOR, AMBELAL PATEL, LEANDER P. STEINHUEBEL, THOMAS HJERTBERG, ERLING M. SORVIK, JOSEPH D. DANFORTH, I. P. HEYWARD, M. G. CHAN, A. G. LUDWICK, JAMES E. PICKETT, C. A. PRYDE, SONG ZHONG JIAN, JULIA LUCKI, JAN F. RABEK, BENGT RÅNBY, D. J. CARLSSON, C. J. B. DOBBIN, J. P. T. JENSEN, D. M. WILES, G. D. MENDENHALL, H. K. AGARWAL, J. M. COOKE, T. S. DZIEMIANOWICZ, L. ZLATKEVICH, R. L. CLOUGH, K. T. GILLEN, WILLIAM J. BAILEY, BENJAMIN GAPUD