Zobrazeno 1 - 10
of 43
pro vyhledávání: '"I. McMackin"'
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in
Autor:
W. Martin, Joseph Perez, John G. Maltabes, D. J. Resnick, K. Selenidis, I. McMackin, Sidlgata V. Sreenivasan
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective method for the replication of nanometer-scale structures from a template mold. Step and Flash Imprint Lithography (S-FIL ® ) is unique in its ability to address both resolution and alignment. Rec
Autor:
Brian Fletcher, Sidlgata V. Sreenivasan, Scott C. Johnson, John G. Maltabes, I. McMackin, Joseph Perez, Kosta Selinidis, Frank Y. Xu, D. J. Resnick
Publikováno v:
SPIE Proceedings.
Researchers have demonstrated that imprint lithography techniques have remarkable replication resolution and can pattern sub-5nm structures. However, a fully capable lithography approach needs to address several challenges in order to be useful in ma
Autor:
Sidlgata V. Sreenivasan, D. J. Resnick, Michael I. Miller, Nick Stacey, M. Falcon, P. Schumaker, M. Subramanian, I. McMackin, Michael P. C. Watts, Jessica Y. Choi, Jin Choi
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2005.
The Step and Flash/spl trade/ Imprint Lithography (S-FIL/spl trade/) process has been developed around a low viscosity, UV curable monomer that allows processing at pressures of < 0.5psi and room temperatures. This leads to a gentle process that has
Autor:
Ecron Thompson, I. McMackin, D. LeBrake, Daniel A. Babbs, Sidlgata V. Sreenivasan, P. Schumaker, Michael Watts, Jin Choi, Va Nguyen, Nick Stacey, Frank Y. Xu
Publikováno v:
Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004..
Summary form only given, as follows. Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Investigation by this group and others has shown that the resolution
Autor:
D. J. Resnick, W. Martin, John G. Maltabes, Frank Y. Xu, Kosta Selinidis, I. McMackin, Joseph Perez, Sidlgata V. Sreenivasan
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:151
Acceptance of imprint lithography for complementary metal-oxide semiconductor (CMOS) manufacturing will require demonstration that it can attain defect levels commensurate with the requirements of cost-effective device production. This article specif
Publikováno v:
Physical Review A. 40:2410-2416
The fluctuation behavior of the mode amplitudes in a multimode dye laser near threshold is investigated numerically. The laser is modeled by semiclassical, third-order laser theory that includes a stochastic Langevin force to simulate quantum noise.
Publikováno v:
Physical Review A. 38:820-832
Experimental and theoretical investigations of a multimode, standing-wave, cw dye laser have been carried out. The optical spectrum of the dye laser was found to evolve by discrete transitions with increasing pump power, between spectra composed of t
Publikováno v:
Annual Meeting Optical Society of America.
We present the results of numerical and experimental investigations into the behavior of multi-mode dye lasers. In an experimental investigation of a two-mirror concentric-cavity dye laser, we find that the individual-mode-intensity fluctuations are
Publikováno v:
Annual Meeting Optical Society of America.
Experimental and theoretical investigations of a multimode standing-wave cw dye laser have been carried out. For a three-mirror cavity the laser spectrum is found to evolve by discrete transitions, with increasing pump power, between spectra composed