Zobrazeno 1 - 3
of 3
pro vyhledávání: '"I. L. van Mil"'
Autor:
M. Hoving, E. A. Hakkennes, I. L. van Mil, H. W. Mook, Marco Jan-Jaco Wieland, V. Kuiper, G. de Boer, C. van den Berg, N. Venema, Thomas Adriaan Ooms, M. Sanderse, J. J. Koning, Remco Jager, Erwin Slot, A. Tudorie, A. Weirsma, A. M. C. Valkering, S. Boschker, T. van de Peut, Bert Jan Kampherbeek, S. Woutersen, Niels Vergeer, S. Postma, P. Scheffers, G. Holgate, Yue Ma
Publikováno v:
Alternative Lithographic Technologies III.
Currently, three MAPPER multi-electron beam lithography tools are operational. Two are located at customers, TSMC and LETI, and one is located at MAPPER. The tools at TSMC and LETI are used for process development. These tools each have 110 parallel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::04ca69288110d977cdad095a84e5e3b4
https://doi.org/10.1117/12.881572
https://doi.org/10.1117/12.881572
Publikováno v:
Japanese Journal of Applied Physics; Jun2012, Vol. 51 Issue 6S, p1-1, 1p
Autor:
Peter W. Hawkes, Erwin Kasper
Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instrum
