Zobrazeno 1 - 4
of 4
pro vyhledávání: '"I. I. Zadiriev"'
Publikováno v:
Plasma Physics Reports. 48:1189-1198
Publikováno v:
Plasma Physics Reports. 48:961-972
Publikováno v:
Journal of Physics: Conference Series. 2379:012018
Experimental study of the rates of plasma-chemical deposition of diamond-like coatings in toluene vapour in capacitive RF discharge was carried out. It is shown that in the RF power range of 100-300 W, the deposition rate is mainly affected by the to
Autor:
Anri A. Rukhadze, Elena Kralkina, V. P. Tarakanov, I. I. Zadiriev, V. B. Pavlov, Konstantin Vavilin
Publikováno v:
Technical Physics. 61:1603-1608
A high-frequency capacitive discharge is simulated in the geometry of a plasma accelerator with closed electron drift. It has been shown that, in such a discharge, as in a dc discharge, an azimuthal electron drift takes place and a potential drop is