Výsledky vyhledávání - "I. G. Dautov"

Analytical calculation of distributions of the electron density and the concentration of impurity ions in a thermal dusty plasma using the jellium model for condensed particles

Autor: N. F. Kashapov, A. R. Shamsutdinov, I. I. Fairushin, I. G. Dautov

Publikováno v: Technical Physics Letters. 43:27-30

Self-consistent spatial distributions of the electron density in the entire volume of condensed-matter particles and the surrounding plasma, as well as distributions of the concentration of ions of easily ionized impurity atoms, are obtained using th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ffc4984b3628fe9b0b4ee0c828fe8b79
https://doi.org/10.1134/s1063785016120063

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Production of silicon coatings by plasma-arc method

Autor: I. G. Dautov, B. A. Timerkaev, O. A. Petrova, R. S. Shamsutdinov, A. V. Mastygin, A. A. Kaleeva

Publikováno v: Journal of Physics: Conference Series. 1870:012014

Silicon coatings consisting of micro and nanopores were obtained by plasma-arc method. An experimental setup was assembled for the synthesis of nanostructures. A number of experiments on the synthesis of silicon nanostructures with changes in paramet

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c171bf846225d04399d9c3433884d5f5
https://doi.org/10.1088/1742-6596/1870/1/012014

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Distribution of the potential and concentration of electrons in low-temperature plasma with hollow microparticles

Autor: N Kashapov, I. G. Dautov, I Fayrushin

Publikováno v: SCOPUS17351472-2017-14-12-SID85034456655

© 2016, Islamic Azad University (IAU). Using approximation of a uniform background (the jellium model) for a condensed dispersed phase, the analytical expressions describing a spatial distribution of the potential of the electric field and electron

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cf43f5fcba28b59e7f72ff9ce16d7113
https://doi.org/10.1007/s13762-016-1054-8

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Characteristics of the arc plasma metal generator

Autor: I. G. Dautov, Kh K Tazmeev

Publikováno v: Journal of Physics: Conference Series. 1328:012077

Erosive electric arc plasma generator was developed and investigated. Studies were carried out at pressures from 1.3·10−3 to 105 Pa in the current range of 25-250 A. Plasma was obtained from the erosion products of titanium and copper electrodes.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c8381115cb2150b79920b9b36e139f12
https://doi.org/10.1088/1742-6596/1328/1/012077

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Akademický článek

Research of plasma impact on migration of silicon in ceramic substrates prepared on the basis of MgO.

Autor: A A Kaleeva, I G Dautov, N F Kashapov, S V Drobyshev

Publikováno v: Journal of Physics: Conference Series; 2019, Vol. 1328 Issue 1, p1-1, 1p

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Akademický článek

Research of the influence of the geometry of the discharge chamber on the characteristics of the arc plasmatron.

Autor: G Yu Dautov, N F Kashapov, I G Dautov, A O Sofronitskiy

Publikováno v: Journal of Physics: Conference Series; 2018, Vol. 1058 Issue 1, p1-1, 1p

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Akademický článek

Calculation of the distribution of temperature in the form based on magnesium oxide for the casting of titanium products.

Autor: N F Kashapov, I G Dautov, L A Tkachenko, S A Fadeev, L R Shaidullin

Publikováno v: Journal of Physics: Conference Series; 2018, Vol. 1058 Issue 1, p1-1, 1p

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Akademický článek

Evaluation of the effectiveness of the use of arc plasma generator with distributed parameters for the deposition of functional coatings at low pressures.

Autor: N. F. Kashapov, G. Yu. Dautov, I. G. Dautov, G. R. Zakirova

Publikováno v: Journal of Physics: Conference Series; 2016, Vol. 669 Issue 1, p1-1, 1p

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