Zobrazeno 1 - 10
of 51
pro vyhledávání: '"I. Dirnstorfer"'
Publikováno v:
Solid State Communications. 116:87-91
Thin CuInSe2 films on glass substrate and solar cells were processed using the ultrasound treatment technique (UST). The SIMS measurements on the films showed a strong reduction of the Na-signal after the UST, which is most likely caused by ultrasoni
Publikováno v:
Thin Solid Films. :504-508
CuInS2 (CIS) films of a typical thickness of 100 nm have been grown epitaxially on sulphur-terminated Si wafers of (001) and (111) orientation and on single-crystalline CaF2 substrates using three-source molecular beam epitaxy (MBE). Epitaxial growth
Publikováno v:
Thin Solid Films. :263-267
In-rich CuInSe 2 films have been submitted to post-growth Cu diffusion. The photoluminescence investigation carried out shows a transition from the commonly observed broad band around 0.94 eV to a much sharper peak around 0.98 5 eV under low excitati
Autor:
S. Eichler, F. Karg, I. Dirnstorfer, J. Gebauer, Reinhard Krause-Rehberg, Bruno K. Meyer, F. Börner
Publikováno v:
Physica B: Condensed Matter. :930-933
Thin (∼1 μm) CuIn(Ga)Se 2 layers were grown by the rapid thermal processing technique under In-rich conditions. The as-grown samples were slightly p-type but highly compensated. They showed strong positron trapping in vacancies, indicated by a lar
Publikováno v:
physica status solidi (a). 168:163-175
Cu-rich and nearly stoichiometric CuIn(Ga)Se2 thin films prepared by the rapid thermal process (RTP) are investigated by electrical and optical methods. The experiments yield that three phases are present in the layers. Cu2—xSe, which determines th
Publikováno v:
Scopus-Elsevier
GaN films were grown epitaxially on sapphire and 6H-SiC substrates by low-pressure chemical vapor deposition (LPCVD) using gallium(III) chloride and ammonia as gallium and nitrogen precursor, respectively. The properties of these samples were examine
Publikováno v:
Materials Science Forum. :1323-1326
Publikováno v:
Materials Science Forum. :1467-1472
Autor:
Jürgen Christen, G Steude, Hartmut Witte, I. Dirnstorfer, Bruno K. Meyer, W Mönch, T.U Kampen, M. Topf, D. Meister, A. Krtschil, S. Fischer
Publikováno v:
Scopus-Elsevier
We report on the optical, electrical and structural properties of GaN films heteroepitaxially grown by low pressure chemical vapor deposition on 6H-SiC substrates. We employed photoluminescence (PL), Hall effect measurements, scanning tunneling micro
Publikováno v:
MRS Proceedings. 449
We report on the heteroepitaxial growth of GaN from GaCl3 and NH3 on (0001) A12O3 and (0001) 6H-SiC substrates. In order to enable homogeneous growth within the entire deposition zone one has to use low process pressures in the 10-1 mbar range, where