Zobrazeno 1 - 6
of 6
pro vyhledávání: '"I. C. Abraham"'
Autor:
C. G. Willison, T. W. Hamilton, D. Kim, B. P. Aragon, Demetre J. Economou, I. C. Abraham, Paul A. Miller, J. R. Woodworth, Randy J. Shul
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 21:147-155
We present an experimental and theoretical study of ion fluxes, energy distributions, and angular distributions close to 300 μm tall “steps” on rf-biased wafers in high-density argon plasmas. This feature size is important in the etching of micr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::333704c07473ea7a01f885b4ac699c85
https://doi.org/10.1116/1.1527951
https://doi.org/10.1116/1.1527951
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:1759-1768
In this article, we present ion energy distributions (IEDs) at a rf-biased surface as a function of driving frequency and ion mass. The experiments were carried out in high-density inductively coupled rare-gas (Ne,Ar,Xe) plasmas. Our quadrupole mass
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::035879148a16ebea3504ac8ca5ef6ef2
https://doi.org/10.1116/1.1502693
https://doi.org/10.1116/1.1502693
Autor:
C. G. Willison, T. W. Hamilton, I. C. Abraham, B. P. Aragon, Paul A. Miller, Randy J. Shul, J. R. Woodworth, Merle E. Riley
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:873-886
We report the measurement of ion energy distributions at a radio frequency (rf)-biased electrode in inductively driven discharges in argon. We compare measurements made with a gridded energy analyzer and a commercial analyzer that contains a mass spe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a05e47e4ba949cbf510ea94fca0a573
https://doi.org/10.1116/1.1472421
https://doi.org/10.1116/1.1472421
Autor:
I. C. Abraham, G. A. Hebner
Publikováno v:
Journal of Applied Physics. 90:4929-4937
Electron and negative ion densities were measured in inductively coupled discharges containing C4F8. In addition, the identity of the negative ions in C2F6, CHF3, and C4F8 containing discharges was investigated with a photodetachment experiment utili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77cd233d72995bf599ebfcc2727eb55e
https://doi.org/10.1063/1.1410896
https://doi.org/10.1063/1.1410896
Autor:
Randy J. Shul, C. G. Willison, Merle E. Riley, J. R. Woodworth, I. C. Abraham, Paul A. Miller
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21:1112
We measured electrical and plasma properties of a deep reactive ion etching Bosch process (Ar/SF6/C4F8) used for micromachining bulk silicon. The plasma-potential oscillations were measured by a glass-enclosed capacitive probe immersed in the plasma.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca77528ee01d321ccf115c6cef5765b2
https://doi.org/10.1116/1.1565145
https://doi.org/10.1116/1.1565145
Autor:
G. A. Hebner, I. C. Abraham
Publikováno v:
Journal of Applied Physics. 91:9539
Electron and negative ion densities were measured in an inductively driven plasma containing mixtures of SF6 and Argon. The electron and negative ion density were measured as functions of the induction coil power, pressure, bias power, and SF6/argon
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4acfae36ffec940aba50e882fb11a201
https://doi.org/10.1063/1.1479459
https://doi.org/10.1063/1.1479459