Zobrazeno 1 - 10
of 36
pro vyhledávání: '"I. Blech"'
Publikováno v:
IEEE Transactions on Electron Devices. 37:159-167
An amorphous silicon layer, confined between metal and single-crystalline silicon, is created by the implantation of ions at high dose into silicon wafers followed by deposition of a metal film. The initial resistance of this structure is very high a
Publikováno v:
Journal of Applied Physics. 53:4202-4207
The stresses of thermally grown as well as chemically vapor deposited (CVD) silicon dioxide were measured by the cantilever beam technique using x‐ray diffraction. Thermally grown oxide shows reversible stress changes upon heating or cooling of the
Publikováno v:
Thin Solid Films. 176:131-142
The effect of amorphizing the surface of (100) silicon substrate on the stability of the microstructure and the composition of Al(2% Cu)Ti/WSi contacts under heat treatments, in N2 gas ambient, at temperatures between 450 and 520 °C was studie
Publikováno v:
Philosophical Magazine. 24:683-693
Vapour-grown platelet crystals of ZnS containing long-period polytypes have been found by x-ray topography to contain a single screw dislocation with a very large Burgers vector parallel to the c axis. Individual polytype regions can have highly perf
Publikováno v:
IEEE Electron Device Letters. 10:180-182
The programmable element consists of a metal/amorphous-silicon/crystalline-silicon structure in which the amorphous-silicon layer is created by high-dose ion implantation. Amorphization by the damage caused by the collisions of the energetic ions wit
Publikováno v:
The Selected Works of John W. Cahn
We have observed a metallic solid (Al-14-at.%-Mn) with long-range orientational order, but with icosahedral point group symmetry, which is inconsistent with lattice translations. Its diffraction spots are as sharp as those of crystals but cannot be i
Publikováno v:
IEEE Journal of Solid-State Circuits. 24:839-841
A method for programming and characterizing electrically programmable elements of the antifuse type (i.e normally open) is described. The programming conditions are controlled by two transistors which isolate the programmable element (PEL) from the b
Publikováno v:
1987 International Electron Devices Meeting.
A novel Ion-Implanted Programmable Element (IPEL) suitable for integration with VLSI technology has been developed. The device operation is based on the electrical properties of a metal/amorphous silicon/single crystal silicon structure made by heavy
Publikováno v:
Thin Solid Films. 48:L19-L20