Zobrazeno 1 - 6
of 6
pro vyhledávání: '"I A Kamyschov"'
Publikováno v:
Plasma Physics Reports. 40:754-759
Results from studies of the parameters of a novel type of plasma source—a hollow cathode magnetron—are presented. The magnetron operates at a gas pressure of 5–20 mTorr, the discharge power being in the range of 0.5–4 kW. At discharge powers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ff935a3b7374c9d1b2c7a7296806deb
https://doi.org/10.1134/s1063780x14090086
https://doi.org/10.1134/s1063780x14090086
Publikováno v:
Journal of Modern Physics. :1494-1502
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means of hollow cathode magnetron. Langmuir probe, optical emission spectroscopy measurements were used to study a mechanism for the production of excited ar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b12965f775216dc0d8c571b060552ecd
https://doi.org/10.4236/jmp.2012.310185
https://doi.org/10.4236/jmp.2012.310185
Publikováno v:
Plasma Sources Science and Technology. 12:449-453
The transverse temperature of sputtered aluminium atoms in an electron cyclotron resonance discharge has been calculated from the shapes of their Doppler broadening emission lines, which were measured with a pressure scanning Fabry–Perot interferom
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6cfa92ed33234d3803c577408c1fd78f
https://doi.org/10.1088/0963-0252/12/3/321
https://doi.org/10.1088/0963-0252/12/3/321
Publikováno v:
Plasma Sources Science and Technology. 24:035009
This paper deals with the characterization of ionized physical vapour deposition (IPVD) by means of a hollow cathode magnetron (HCM). The pressure is 10 mTorr with 2.2 kW discharge power. A Langmuir probe was used to study the spatial distribution of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c225d676c5df2c4256aac4c8b7441bff
https://doi.org/10.1088/0963-0252/24/3/035009
https://doi.org/10.1088/0963-0252/24/3/035009
Publikováno v:
Plasma Sources Science & Technology; Jun2015, Vol. 24 Issue 3, p1-1, 1p