Removal and dispersal of biofluid films by powered medical devices: Modeling infectious agent spreading in dentistry

Autor: Ramanarayanan Balachandran, Sara Watson, Nicolas Szita, Emad Moeendarbary, Martin Hyde, Somayeh Shahreza, Francesco D'Aiuto, Yuan-Ling Ng, Kishor Gulabivala, J. Suvan, Hywel O. Davies, Yousef Javanmardi, Ian Eames, Janette Khajeh

Publikováno v: iScience, Vol 24, Iss 11, Pp 103344-(2021)
iScience

Summary Medical procedures can disperse infectious agents and spread disease. Particularly, dental procedures may pose a high risk of disease transmission as they use high-powered instruments operating within the oral cavity that may contain infectio

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::30a168e4e424f7e3f8ac245adf17f2ff
http://www.sciencedirect.com/science/article/pii/S2589004221013134

Investigating Ethanol-Gasoline Spray Characteristics Using an Interferometric Drop Sizing Technique

Autor: Midhat Talibi, Ramanarayanan Balachandran, Hywel O. Davies, Martin Hyde

Publikováno v: Volume 6: Ceramics; Controls, Diagnostics, and Instrumentation; Education; Manufacturing Materials and Metallurgy.

To reduce reliance on fossil fuels there has been a global push to minimise fuel consumption, and incorporate the use of bio-derived fuels. In practical combustion systems that use liquid fuels, observing the spray behaviour of these biofuels is key

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::94295c5bafe41fa81c3b04852f8a1787
https://doi.org/10.1115/gt2019-91421

Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition

Autor: Peter Nicholas Heys, Matthew Werner, J. S. Wrench, Helen C. Aspinall, J. Basca, Anthony C. Jones, Hywel O. Davies, Paul R. Chalker, Peter J. King, Kate Black

Publikováno v: Thin Solid Films. 519:4192-4195

Cerium oxide dielectric thin films have been grown on n-type silicon by atomic layer deposition using a monomeric homoleptic Ce IV alkoxide precursor with water vapour. Herein we report the dielectric properties of CeO 2 films deposited from tetrakis

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ad5da5160dd91cf2755a24caecb66ea1
https://doi.org/10.1016/j.tsf.2011.02.025

Bis(cyclopentadienyl) zirconium(IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD

Autor: SE Stephen Potts, Hywel O. Davies, Fawzi Abou-Chahine, Claire J. Carmalt, Noemi Leick, Christopher S. Blackman, Wilhelmus M. M. Kessels, Peter Nicholas Heys

Publikováno v: Inorganica Chimica Acta, 363(6), 1077-1083. Elsevier

Low pressure chemical vapour deposition (LPCVD) of [ZrCp 2 (NMe 2 ) 2 ] ( 1 ), [ZrCp 2 (η 2 -MeNCH 2 CH 2 NMe)] ( 2 ), [ZrCp′ 2 (NMe 2 ) 2 ] ( 3 ) and [ZrCp′ 2 (NEt 2 ) 2 ] ( 4 ) (Cp = η 5 -cyclopentadienyl, Cp′ = η 5 -monomethylcyclopentadi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a51f70619dae410bcfe7f31734c9d2d9
https://doi.org/10.1016/j.ica.2009.07.004

MOCVD of Zirconium Oxide from the Zirconium Guanidinate Complex [ZrCp′{η2-(iPrN)2CNMe2}2Cl]

Autor: Claire J. Carmalt, SE Stephen Potts, David Pugh, Savio J. A. Moniz, Hywel O. Davies, Christopher S. Blackman

Publikováno v: 17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4-9 October 2009, Vienna, 561-565
STARTPAGE=561;ENDPAGE=565;TITLE=17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4-9 October 2009, Vienna

Parallel to successful studies into use of [ZrCp'{¿ 2-(iPrN)2CNMe2} 2Cl] as a precursor to the deposition of zirconium carbonitride via CVD the same precursor was utilised for the MOCVD of thin films of ZrO 2 using borosilicate glass substrates. The

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::75f94dae9d5605853b8911d7a5e83664
https://doi.org/10.1149/1.3207640