Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Hyung-ho Ko"'
Autor:
Hyung-Kun Kim, Hyun-Sung Shin, Chun-Gyoo Lee, Hyung-ho Ko, K. H. Lee, Lee Han-Jun, Kim Chulkwi, Jinman Han
Publikováno v:
physica status solidi (c). 2:2137-2140
Free-standing GaN substrates are of great importance for short wavelength Laser Diodes (LDs) and high performance Light Emitting Diodes (LEDs) applications. One of the technical barriers for the applications is relatively high threading dislocation d
Autor:
Seong-Sue Kim, Il-Yong Jang, Hyung-ho Ko, Byung-Gook Kim, Jungyoup Kim, Chan-Uk Jeon, Jaehyuck Choi, Hwan-Seok Seo, Soowan Koh, Su-Young Lee
Publikováno v:
SPIE Proceedings.
In EUV Lithography, an absence of promising candidate of EUV pellicle demands new requirements of EUV mask cleaning which satisfy the cleaning durability and removal efficiency of the various contaminations from accumulated EUV exposure. It is known
Autor:
Ho Young Kim, Kun Tack Lee, Joo Tae Moon, Woo Gwan Shim, Yong Pil Han, Sang Rok Hah, Hyung Ho Ko
Publikováno v:
Solid State Phenomena. :15-18
Autor:
Min Soo Kim, Bong-Kyun Kang, Hyung Ho Ko, Jin-Goo Park, Chan-Uk Jeon, Jinho Ahn, Han Shin Lee, Hyuk Min Kim, Seung-Ho Lee, Han-Ku Cho
Publikováno v:
SPIE Proceedings.
The adaption of EUVL requires the development of new cleaning method for the removal of new contaminant without surface damage. One of the harsh contaminants is the carbon contamination generated during EUV exposure. This highly dense organic contami
Autor:
Dong-Un Lee, Han-Ku Cho, Han-Shin Lee, Chan-Uk Jeon, Seong Su Kim, Jaehyuck Choi, Hyung-ho Ko
Publikováno v:
SPIE Proceedings.
Photo-induced defect for optic mask mainly depends on the surface residual ions coming from cleaning process, pellicle outgassing, or storage environments. Similar defect for EUV mask triggered by accumulated photon energy during photolithography pro
Autor:
Deog-Kyoon Jeong, Jaeha Kim, Bongjoon Lee, Sang Yoon Lee, Hwi-Cheol Kim, Hyung-Ho Ko, Dong-il Dan Cho
Publikováno v:
2006 IEEE Asian Solid-State Circuits Conference.
A bandpass ΔΣ interface IC for sacrificial bulk micromachined inertial sensors is presented. To achieve high resolution without precision analog circuits, the proposed architecture replaces the analog mixer of a chopper-stabilized readout amplifier
Autor:
Hyo-Yeon Kim, Byung-Gook Kim, Han-Shin Lee, Chan-Uk Jeon, Dohyung Kim, Hyung-ho Ko, Junyoul Choi, Jin Su Kim, Jaehyuck Choi, Soowan Koh
Publikováno v:
ECS Meeting Abstracts. :2107-2107
It has been challenging to find suitable chemistries for cleaning of EUV mask consisting of various materials including multilayer (multiple stacking layer of silicon/ molybdenum), absorber, and capping layers. Recent investigation reveals that tanta
Autor:
Sang-Yoon Lee, Jaeha Kim, Bong-Joon Lee, Hwi-Cheol Kim, Hyung-Ho Ko, Dong-il Cho, D., Deog-Kyoon Jeong
Publikováno v:
2006 IEEE Asian Solid-State Circuits Conference; 2006, p439-442, 4p