Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Hyun-Kyu Ryu"'
Publikováno v:
2020 IEEE 70th Electronic Components and Technology Conference (ECTC).
The effect of low-temperature curable polybenzoxazole (PBO) process conditions on the interfacial adhesion energies between PBO dielectric and Cu redistribution layer for advanced fan-out packaging (FO package) were systematically investigated. The i
Publikováno v:
Research on Chemical Intermediates. 2000, Vol. 26 Issue 5, p499. 15p. 1 Diagram, 1 Chart, 10 Graphs.
Publikováno v:
Microelectronics Journal. 38:125-129
An etching of a SiO2 contact hole with a diameter of 0.19μm and an aspect ratio of 13, using C4F6/Ar/O2/CH2F2 and c-C4F8/Ar/O2/CH2F2 plasmas, was performed for a feasibility test of the use of unsaturated fluorocarbons (UFCs) as an alternative to pe
Publikováno v:
Korean Journal of Chemical Engineering. 23:153-158
Strontium titanate (Sr x Ti y O z ) thin films were prepared by a chemical vapor deposition method using gaseous compounds, obtained by vaporizing a solid mixture of Sr(dpm)2 and Ti(O-iPr)2(dpm)2 in one step, as the metal sources. The compositions of
Publikováno v:
JOURNAL OF CHEMICAL ENGINEERING OF JAPAN. 38:922-928
An Al dual damascene process for the metallization of sub-100 nm dynamic random access memory devices was performed, and the effects of wafer cleaning method on the damascene structures and their electrical properties were investigated. Interconnect
Etch Characteristics of Silsesquioxane-based Low Dielectric Constant Material in Fluorocarbon Plasma
Autor:
Hyun-Kyu Ryu, Sung-Wook Hwang, Yun Seok Cho, Jae-Ho Min, Sang Heup Moon, Yu Chang Kim, Gyeo-Re Lee, Jinwoong Kim
Publikováno v:
Japanese Journal of Applied Physics. 41:5782-5786
The etch characteristics of hydrido-organo-siloxane-polymer (HOSP), a typical silsesquioxane-based low-dielectric material, were compared with those of silicon dioxide in CF4 and CHF3 plasmas. The etch-rate ratios of the two materials are more signif
Publikováno v:
Research on Chemical Intermediates. 26:499-513
We have investigated the thermal decomposition behavior of Ba(DPM)2 using thermogravimetry (TG), mass spectrometry (MS), ultraviolet (UV) absorption and in-situ Fourier transform infrared (FTIR) spectroscopy. FTIR has been used particularly for direc
Publikováno v:
Korean Journal of Chemical Engineering. 16:774-777
We have investigated the degradation mechanism of Ba(DPM)2, which has been stored in a desiccator for extended periods using thermogravimetry, FTIR and mass spectroscopy TG analysis shows that the aged sample loses the initial weight significantly at
Publikováno v:
Journal of The Electrochemical Society. 146:1117-1121
The thermal decomposition behavior of Ti(O-iPr) 2 (DPM) 2 has been studied using thermogravimetry and infrared and mass spectroscopy. Particularly, dissociation of the chemical bonds in the complex ligand have been monitored from the IR spectra of th
Publikováno v:
Journal of The Electrochemical Society. 142:3980-3984
The authors have calculated the equilibrium composition of the solid phase produced in the metallorganic chemical vapor deposition (MOCVD) process that uses Ba(2,2,6,6-tetramethyl-3,5-heptanedione){sub 2}, Sr(2,2,6,6-tetramethyl-3,5-heptane-dione){su