Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Hyun-Joon Roh"'
Autor:
Seolhye Park, Jaegu Seong, Yunchang Jang, Hyun-Joon Roh, Ji-Won Kwon, Jinyoung Lee, Sangwon Ryu, Jaemin Song, Ki-Baek Roh, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim
Publikováno v:
Journal of the Korean Physical Society. 80:647-669
Autor:
Gon-Ho Kim, Nam-Kyun Kim, Sanywon Ryu, Sangmin Jeong, Seolhye Park, Ji-Won Kwon, Yunchang Jang, Hyun-Joon Roh
Publikováno v:
Current Applied Physics. 19:1068-1075
A phenomenology-based virtual metrology (VM) for monitoring SiO2 etching depth was proposed by Park (2015). It achieved high prediction accuracy by introducing newly developed plasma information (PI) variables as designated inputs, called PI-VM. The
Publikováno v:
The Journal of Korean Institute of Communications and Information Sciences. 43:791-800
본 연구는 UHD와 같은 초고화질 영상의 실시간 재생과 모바일 디바이스들에 탑재되는 비대칭 멀티코어를 위한 새로운 HEVC 타일 할당 기법을 제안한다. 이 기법은 병렬처리를 위해 타일을 사
Autor:
Gon-Ho Kim, Younggil Jin, Nam-Kyun Kim, Sangwon Ryu, Hyun-Joon Roh, Seolhye Park, Yunchang Jang
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 31:232-241
A phenomenological-based virtual metrology (VM) technique is developed for predicting the silicon nitride film thickness in multi-layer plasma-enhanced chemical vapor deposition (PECVD). Particularly, the analysis of optical emission spectroscopy bas
Autor:
Daegeun Ha, Damdae Park, Chonghun Han, Junmo Koo, Kye Hyun Baek, Hyun-Joon Roh, Gon-Ho Kim, Sangwon Ryu
Publikováno v:
Computers & Chemical Engineering. 100:38-47
With the advent of more than Moore’s law era, control of plasma etch process is expected to become inevitable. Given that highly complex plasma is a medium of etch processes, plasma parameters are key factors to be controlled. In addition, highly i
Publikováno v:
Multimedia Tools and Applications. 76:25271-25284
This paper proposes a novel Tile allocation method considering the computational ability of asymmetric multicores as well as the computational complexity of each Tile. This paper measures the computational ability of asymmetric multicores in advance,
Publikováno v:
Journal of KIISE. 43:1060-1065
Autor:
Ki-Baek Roh, Gon-Ho Kim, Hyun-Joon Roh, Yunchang Jang, Jae-Min Song, Byeongjun Bae, Nam-Kyun Kim, Sangwon Ryu, Younggil Jin
Publikováno v:
Journal of the Korean Physical Society. 69:518-524
The type of induced material damage in the tungsten irradiated by using deuterium ions was investigated for various value of the fluence at low energy. Experiments were carried out in an electron cyclotron resonance (ECR) plasma source that provided
Autor:
Gon-Ho Kim, Seolhye Park, Yunchang Jang, Sangmin Jeong, Hyun-Joon Roh, Sangwon Ryu, Jae-Myung Choe
Publikováno v:
Thin Solid Films. 603:154-159
Vacuum pumps of different ages were used to prepare Cl 2 based plasmas for use in Cr etching. The effects of the vacuum pump age on the etching results were investigated using optical emission spectroscopy analysis. The composition of gas at the base
Autor:
Hyun-Joon Roh, Seok-Hwan Lee, Nam-Kyun Kim, Sung-Ryul Huh, Sangwon Ryu, Seolhye Park, Gon-Ho Kim
Publikováno v:
Current Applied Physics. 15:1173-1183
Acceptable data for electron energy probability function (EEPF) measurement in low-pressure plasmas require a small depletion in near-zero electron energy and a large dynamic range in the high-energy regime. The voltage drop across internal resistanc