Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Hyuk Ryeol Park"'
Autor:
Sang-Chul Jung, Hyuk Ryeol Park, Ung Il Kang, Wang-Geun Shim, Ho-Young Jung, Sang Chai Kim, Young-Kwon Park
Publikováno v:
Journal of Nanoscience and Nanotechnology. 19:1208-1212
Catalytic combustion of benzene, toluene, and hexane (BTH) was carried out to investigate in this study the effect of palladium precursor on the property and performance of 1 wt.% Pd/γ-Al₂O₃. Properties were characterized by X-ray diffraction (X
Autor:
Hyuk-Ryeol Park, Ji-Ae Choi
Publikováno v:
New Physics: Sae Mulli. 67:883-889
Publikováno v:
New Physics: Sae Mulli. 65:850-855
Electrical Conductivity Behaviors Caused by Atmospheric Adsorption in Microcrystalline Silicon Films
Autor:
Tae-Hyun Lim, Hyuk-Ryeol Park
Publikováno v:
New Physics: Sae Mulli. 64:877-882
Autor:
Jae Sung Yun, Jongsung Park, Cheolhyun Lim, Changheon Kim, Suk-Ho Lee, Hyuk-Ryeol Park, Dohyung Kim, Gunho Kim
Publikováno v:
Thin Solid Films. 689:137523
We present the synthesis of surface-fluorinated, rutile-rich, meso-macroporous TiO2 nanofibers via simple post-treatment in a 5% hydrogen fluoride solution at room temperature and atmospheric pressure. Using various characterization methods, we demon
Autor:
Tae-Hyun Lim, Hyuk-Ryeol Park
Publikováno v:
New Physics: Sae Mulli. 61:797-803
Autor:
Tae-Hyun Lim, Hyuk-Ryeol Park
Publikováno v:
New Physics: Sae Mulli. 60:811-816
Autor:
Geuk-Jeong Bang, Hyuk-Ryeol Park
Publikováno v:
Journal of Non-Crystalline Solids. 353:4174-4177
The transient photocapacitance spectroscopy (TPC) was applied to measure the optical absorption spectra of hydrogenated amorphous silicon (a-Si:H) in metal-insulator–semiconductor (MIS) structure. The measured spectra show the features of optical t
Autor:
Gye-Choon Park, Woon-Jo Jeong, Joung-Yun Park, Hyeon-Hun Yang, Ho-Geun Ahn, Young-Jun Kim, Hyuk-Ryeol Park, Chang-Dae Kim
Publikováno v:
physica status solidi c. 3:2601-2605
Process variables for manufacturing CuInSe2 thin films were established in order to clarify optimum conditions for growth of the thin film depending upon process conditions (substrate temperature, sputtering pressure, DC/RF power), and then by changi
Publikováno v:
Journal of Applied Physics. 90:6226-6229
The capatiance–voltage characteristics associated with the hole accumulation in hydrogenated amorphous silicon metal–insulator–semiconductor structures were investigated. The capacitance was measured by using an ac voltage and a quasistatic met