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Autor:
Dong-Hyun Kim, Soo-Han Choi, Moon-Hyun Yoo, Jeong-Taek Kong, Eun-Sung Kim, Yongchan Ban, A-Young Je, Dae-Youp Lee, Hyoung-Joo Youn, Yoo-Hyon Kim, Tae-Hoon Park, Ji-Suk Hong
Publikováno v:
Optical Microlithography XVIII.
The k1 factor of the 65nm node device approaches to around 0.3 or even below because the device shrinking is much faster than the development speed of the high NA ArF scanner. Since the conventional model-based OPC (MBOPC) is only focused on patterni
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::67e2f44463fa7ad9b329bfe878567fc8
https://doi.org/10.1117/12.600249
https://doi.org/10.1117/12.600249
