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pro vyhledávání: '"Hyoung-Dong Kang"'
Autor:
In-Gyu Park, Hyoung-Dong Kang, Gi-Chung Kwon, Beop-Jong Jin, Myoung-Soo Yun, Deoc-Hwan Hyun, Joung-Sik Kim, Jong-Yong Choi
Publikováno v:
Journal of the Korean Vacuum Society. 19:314-318
We fabricated a plasma texturing for multi-crystalline silicon cells using reactive ion etching (RIE). Multi-crystalline Si cells have not benefited from the cost-effective wet-chemical texturing processes that reduce front surface reflectance on sin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cdd37038d37dcfb4392403316b4cec5
https://doi.org/10.5757/jkvs.2010.19.4.314
https://doi.org/10.5757/jkvs.2010.19.4.314
