Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Hyoseok Choi"'
Publikováno v:
International Journal of Hydrogen Energy. 37:405-411
Tantalum nitride (TaN) thin films are deposited on AISI 316L stainless steel by inductively coupled, plasma-assisted, reactive magnetron sputtering at various N 2 flow rates. TaN film behavior is investigated in simulated polymer electrolyte membrane
Publikováno v:
International Journal of Hydrogen Energy. 36:2207-2212
Austenitic stainless steel (AISI 316L) is nitrided by inductively coupled plasma using a gas mixture of N 2 and H 2 at temperatures between 530 K and 650 K, and the corrosion resistance as well as the interfacial contact resistance (ICR) are measured