Zobrazeno 1 - 10
of 146
pro vyhledávání: '"Hyo-Chang Lee"'
Autor:
Ho Jin Ma, Seonghyeon Kim, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Jung-Hyung Kim, Hyo-Chang Lee, Young-Jo Park
Publikováno v:
Scientific Reports, Vol 14, Iss 1, Pp 1-12 (2024)
Abstract In the semiconductor manufacturing process, when conducting inductively coupled plasma-reactive ion etching in challenging environments, both wafers and the ceramic components comprising the chamber’s interior can be influenced by plasma a
Externí odkaz:
https://doaj.org/article/d936b4da80af4788a9e1ec14ad48873a
Autor:
Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Youngseok Lee, Jung-Hyung Kim, Shin-Jae You, Hyo-Chang Lee
Publikováno v:
ACS Omega, Vol 8, Iss 36, Pp 32450-32457 (2023)
Externí odkaz:
https://doaj.org/article/da121a37c39641ad8accc680824953d4
Autor:
Eun-Seok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, Hee-Jung Yeom, Min Young Yoon, Seongwan Hong, Dong-Wook Kim, Jung-Hyung Kim, Hyo-Chang Lee
Publikováno v:
Advanced Materials Interfaces; 3/5/2024, Vol. 11 Issue 7, p1-9, 9p
Publikováno v:
Applied Science and Convergence Technology. 32:34-37
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d6b818b56704465840c3b99a2e72e71
https://doi.org/10.5757/asct.2023.32.2.34
https://doi.org/10.5757/asct.2023.32.2.34
Publikováno v:
Journal of Applied Physics. 133
We investigated the effect of the sheath around the probe tips on the transmission spectrum of a cutoff probe using an electromagnetic simulation and a circuit model. Our results show that the width of the sheath can change the transmission spectrum,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b36bbb82f1aa6889ccc70f04fa64f0b9
https://doi.org/10.1063/5.0145958
https://doi.org/10.1063/5.0145958
Autor:
Si Jun Kim, Jang Jae Lee, Young Seok Lee, Hee Jung Yeom, Hyo Chang Lee, Jung-Hyung Kim, Shin Jae You
Publikováno v:
Applied Sciences, Vol 10, Iss 20, p 7066 (2020)
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S21) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstr
Externí odkaz:
https://doaj.org/article/f307b7f7fb924c2e9292686bc7075999
Autor:
Ho Jin Ma, Seongwan Hong, Hyeon-Myeong Oh, Kundan Kumar, Mi-Ju Kim, Ha-Neul Kim, Jae-Woong Ko, Jae-Wook Lee, Hyo-Chang Lee, Young-Jo Park
Publikováno v:
ACS applied materialsinterfaces. 14(38)
In the semiconductor fabrication industry, high-power plasma is indispensable to obtain a high aspect ratio of chips. For applications to ceramic components including the dielectric window and ring in the semiconductor etching chamber, the Y
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::589e0002c365cda384ceac5cfbac6f71
https://pubmed.ncbi.nlm.nih.gov/36099583
https://pubmed.ncbi.nlm.nih.gov/36099583
Publikováno v:
Applied Science and Convergence Technology. 30:102-106
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fc0f428498da73655aac072281f86b5
https://doi.org/10.5757/asct.2021.30.4.102
https://doi.org/10.5757/asct.2021.30.4.102
Publikováno v:
Applied Physics Letters. 122:114103
In the industrial semiconductor plasma processing, plasma density and its spatial distribution are critical for the understanding of discharge physics and the enhancement of the processing yield via monitoring of the status of plasma processing. Thus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2bce7dcf8bbca3f03dc72314633794e9
https://doi.org/10.1063/5.0129790
https://doi.org/10.1063/5.0129790
Publikováno v:
Carbon. 162:423-430
Carbon nanotips and nanowhiskers were produced through etching of an amorphous carbon layer (ACL) by controlling the plasma environment. Discharge types and different gases induced significant changes in the carbon nanostructure owing to the independ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::551cce0ff933db78b9697ce1c1b10e02
https://doi.org/10.1016/j.carbon.2020.02.068
https://doi.org/10.1016/j.carbon.2020.02.068