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Autor:
Jang-Seop Kim, Jea-Gun Park, Hyung-Kook Park, Hyeung-il Park, Byeong-Sam Moon, Sanghyun Lee, Anselmo Jaehyeong Lee, Jeong-Hoon An
Publikováno v:
ECS Transactions. 75:103-107
Gettering techniques are the key features in recent semiconductor industry to develop the high performance devices. Above all, the intrinsic gettering is considered as the easiest way to achieve metal gettering effect in a silicon substrate with the