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pro vyhledávání: '"Hyekyoung Jue"'
Autor:
Jürgen Preuninger, Ulrich Klostermann, Jongsu Kim, Hans-Jürgen Stock, Ulrich Welling, Sang-Yil Chang, Hyungju Ryu, Kyoung-sub Shin, Wolfgang Demmerle, Eunsoo Jeong, Hyekyoung Jue, Joon-Soo Park, Jung-Hoe Choi, Sang-Jin Kim
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
For the past years, ArF immersion has been employed as the major lithography tool in the foundry manufacturing to fabricate the patterns of minimum pitch and size. However, for semiconductor scaling beyond N7 the application of EUV lithography is con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab0c4bfe75ff6b348a87b2afdefcea26
https://doi.org/10.1117/12.2553319
https://doi.org/10.1117/12.2553319
