Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Hyang Kyun (Helen) Kim"'
Autor:
Masafumi Asano, Koichi Wakamoto, Matthew Sendelbach, Paul Isbester, Chas Archie, Alok Vaid, Carmen Osorio, Kazuto Matsuki, Niv Sarig, Hyang Kyun (Helen) Kim
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
When designing an experiment to assess the accuracy of a tool as compared to a reference tool, semiconductor metrologists are often confronted with the situation that they must decide on the sampling strategy before the measurements begin. This decis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3627d2df9e08353c8dd18e983c4a01be
https://doi.org/10.1117/12.2048933
https://doi.org/10.1117/12.2048933
Autor:
Hyang Kyun (Helen) Kim, Boaz Brill, Igor Turovets, Susan Emans, Alok Vaid, Boris Sherman, Cornel Bozdog, Ronen Urensky, Matthew Sendelbach
Publikováno v:
SPIE Proceedings.
Improvement in metrology performance when using a combination of multiple optical channels vs. standard single optical channel is studied. Two standard applications (gate etch 4x and STI etch 2x) are investigated theoretically and experimentally. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a313703da3f0572224c9a1d1cb170656
https://doi.org/10.1117/12.881638
https://doi.org/10.1117/12.881638
Autor:
Alok Vaid, Boaz Brill, Cornel Bozdog, Yoel Cohen, Carsten Hartig, Stanislav Stepanov, Matthew Sendelbach, Michael Sendler, Victor Kucherov, Hyang Kyun (Helen) Kim
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
This paper discusses a novel methodology of material characterization that directly utilizes the scatterometry targets on the product wafer to determine the optical properties (n&k) of various constituent materials. Characterization of optical consta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f6546435389f3100b1b9a3fec23fb1f
https://doi.org/10.1117/12.814380
https://doi.org/10.1117/12.814380
Autor:
Matthew Sendelbach, Paul Isbester, Carmen Osorio, Kazuto Matsuki, Masafumi Asano, Hyang Kyun (Helen) Kim, Niv Sarig, Chas Archie, Koichi Wakamoto
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:041414
Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5bb245f7ea29a4b690c2e60a2c997603
https://doi.org/10.1117/1.jmm.13.4.041414
https://doi.org/10.1117/1.jmm.13.4.041414
Autor:
Michael Sendler, Cornel Bozdog, Hyang Kyun (Helen) Kim, Stanislav Stepanov, Nelson Felix, Daniel Moore, Alok Vaid, Timothy A. Brunner, Victor Kucerov, Matthew Sendelbach, Pawan Rawat
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 9:041306
Optical properties (n and k) of the material films under measurement are commonly assumed invariant and fixed in scatterometry modeling. This assumption keeps the modeling simple by limiting the number of floating parameters in the model. Such scatte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c1799b534a2bc67c359b79c14d61391
https://doi.org/10.1117/1.3514707
https://doi.org/10.1117/1.3514707
Autor:
Sendelbach, Matthew, Sarig, Niv, Koichi Wakamoto, Hyang Kyun (Helen) Kim, Isbester, Paul, Masafumi Asano, Kazuto Matsuki, Osorio, Carmen, Archie, Chas
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Oct-Dec2014, Vol. 13 Issue 4, p041414-1-041414-14, 14p