Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Hwan Soo Jang"'
Publikováno v:
IEEE Access, Vol 8, Pp 139156-139160 (2020)
To increase the radio-frequency (RF) performance of AlGaN/GaN-based fin-type high electron mobility transistors (HEMTs), a novel T-gate process was developed and applied to fabricate a device with high RF performance. In a single lithography process,
Externí odkaz:
https://doaj.org/article/f7ddc6afc1a5438ba3938f5f2ebfda3c
Publikováno v:
IEEE Access, Vol 8, Pp 139156-139160 (2020)
To increase the radio-frequency (RF) performance of AlGaN/GaN-based fin-type high electron mobility transistors (HEMTs), a novel T-gate process was developed and applied to fabricate a device with high RF performance. In a single lithography process,
Autor:
Dae-Hyun Kim, Young-Woo Jo, Ki-Sik Im, Hwan Soo Jang, In Man Kang, Jae Hwa Seo, Chul-Ho Won, Dong-Hyeok Son, Jung-Hee Lee, Yong Soo Lee
Publikováno v:
Solid-State Electronics. 145:1-7
GaN gate-all-around (GAA) vertical nanowire MOSFET (VNWMOSFET) with channel length of 300 nm and diameter of 120 nm, the narrowest GaN-based vertical nanowire transistor ever achieved from the top-down approach, was fabricated by utilizing anisotropi
Autor:
Jae Hwa Seo, In Man Kang, Young Jun Yoon, Dong-Hyeok Son, Hwan Soo Jang, Jung-Hee Lee, Chul-Ho Won, Young-Woo Jo
Publikováno v:
IEEE Electron Device Letters. 37:855-858
Superior device characteristics have been demonstrated with a novel Al(In)N/GaN-based steep fin-type high electron mobility transistor (HEMT) with a fin width ( $W_{\mathrm{ fin}}$ ) of 120 nm, a fin height ( $H_{\mathrm{ fin}})$ of 250 nm, and a gat
Autor:
Kwang-ho Jang, Kyoungho Suk, Sang-Hyun Kim, Il-Sung Jang, Hwan-Soo Jang, Maan-Gee Lee, Jeoung-Hee Ha, Ji Young Jung
Publikováno v:
Pharmacology Biochemistry and Behavior. 101:217-221
L-theanine has been reported to inhibit the excitatory effects of caffeine. The present study examined the effects of L-theanine on caffeine-induced sleep disturbances in rats. Rats received the following drug pairings: saline and saline (Control), 7
Publikováno v:
Journal of Nanoscience and Nanotechnology. 12:3567-3570
We report on the fabrication of silicon nanostructures with a high aspect ratio that were created using a combination of electrochemical etching and alkaline etching. With this technique, we were able to fabricate nano- and/or micro-wire structures t
Autor:
Seong-Ho Baek, Jin Woo Han, Hwan Soo Jang, Jeong-hwan Kim, Byeong Yun Oh, Gi Seok Heo, Tae-Won Kim, Dae Shik Seo, Jae Hyun Kim, Ho-Jin Choi, Kwang Young Kim
Publikováno v:
Current Applied Physics. 12:273-279
Structural, electrical, and optical properties of atomic layer-controlled Al-doped ZnO (ZnO:Al) films grown by atomic layer deposition (ALD) on glass substrates were characterized at various growth temperatures for use as transparent electrodes. The
Publikováno v:
Current Applied Physics. 11:S30-S33
The characteristics of optical absorption and photovoltaic properties of silicon(Si) wire solar cells with different aspect ratio have been studied. Vertically aligned Si wire arrays were fabricated by electrochemical etching and p–n junction was p
Publikováno v:
Current Applied Physics. 11:S34-S38
We present optimization of electrochemical etching process in p-type silicon because the formation of p-type ordered porous silicon or silicon wire arrays has not been well documented compared with n-type ones. In order to prepare and fabricate p-typ
Publikováno v:
Journal of The Electrochemical Society. 159:D37-D45