Výsledky vyhledávání - "Hwan Chul Jeon"

Fabrication of Au-Decorated 3D ZnO Nanostructures as Recyclable SERS Substrates

Autor: Jung-Dae Kwon, Byung Jin Cho, Dongho Kim, MinKyoung Lee, Myungkwan Song, Hwan Chul Jeon, Chang Su Kim, ChaeWon Mun, Tae Yoon Jeon, Sung-Gyu Park

Publikováno v: IEEE Sensors Journal. 16:3382-3386

Highly roughened Au-decorated 3D ZnO nano-structures were prepared using a combination of prism holographic lithography and atomic layer deposition techniques. Prism holographic lithography is a simple and rapid method for fabricating ordered 3D nano

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::35f58c14093d0d41e034cf181a76ca50
https://doi.org/10.1109/jsen.2015.2418787

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Hierarchical nanostructures created by interference of high-order diffraction beams

Autor: Seung-Man Yang, Tae Yoon Jeon, Hwan Chul Jeon, Shin-Hyun Kim

Publikováno v: Journal of Materials Chemistry C. 4:1088-1095

We report a novel method to create 2D hierarchical nanopatterns with high structural complexity using phase-shift lithography. With phase masks with large lattice periodicities relative to the wavelength of the light source, several different diffrac

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::57d8d69cc27eb67734c1752bf30fcb64
https://doi.org/10.1039/c5tc03240g

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Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm

Autor: Ji-Beom Yoo, Seul-Gi Kim, Soo-Young Kim, Byung-Gook Kim, Hwan Chul Jeon, Sang Jin Cho, Taesung Kim, Changgu Lee, Sungjoo Lee, Jung Hun Lee, Cheol-Woong Yang, Mun Ja Kim, Dong-Wook Shin

Publikováno v: Nanoscale. 7:14608-14611

Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick graphite film (NGF), which shows

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::37352cc697cf76b95d6d7c0769a21732
https://doi.org/10.1039/c5nr03079j

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Fabrication of 3D ZnO hollow shell structures by prism holographic lithography and atomic layer deposition

Autor: Jung-Dae Kwon, Sung-Gyu Park, Byung Jin Cho, Seung-Man Yang, Tae Yoon Jeon, Chang Su Kim, ChaeWon Mun, Hwan Chul Jeon, Dongho Kim

Publikováno v: J. Mater. Chem. C. 2:1957-1961

Highly uniform 3D ZnO hollow shell structures were prepared by combining prism holographic lithography (PHL) and atomic layer deposition (ALD). As a dense ZnO film was obtained by using the ALD process, no volume shrinkage occurred during the subsequ

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7837177c38fad2b91b49b330a25e049a
https://doi.org/10.1039/c3tc32366h

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Freestanding and Arrayed Nanoporous Microcylinders for Highly Active 3D SERS Substrate

Autor: Hyelim Kang, Hwan Chul Jeon, Hyeong Jun Kim, Bumjoon J. Kim, Shin-Hyun Kim, Minsoo Kim, Seung-Man Yang, Su Yeon Lee

Publikováno v: Chemistry of Materials. 25:2421-2426

Surface-enhanced Raman scattering (SERS) has been considered as one of the most promising tools for molecular analysis. To develop practical platforms, a variety of nanoparticles and two-dimensional (2D) nanostructures have been prepared. However, lo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::556dc9a0bcf337b80a98c72d8bd272b7
https://doi.org/10.1021/cm400298e

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Durable Plasmonic Cap Arrays on Flexible Substrate with Real-Time Optical Tunability for High-Fidelity SERS Devices

Autor: Chul-Joon Heo, Hwan Chul Jeon, Hyelim Kang, Seung-Man Yang, Su Yeon Lee

Publikováno v: ACS Applied Materials & Interfaces. 5:4569-4574

Active tunable plasmonic cap arrays were fabricated on a flexible stretchable substrate using a combination of colloidal lithography, lift-up soft lithography, and subsequent electrostatic assembly of gold nanoparticles. The arrangement of the plasmo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::99b11d3ccccb7a9538328d06b1ae6dd8
https://doi.org/10.1021/am400019v

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Study of nanometer-thick graphite film for high-power EUVL pellicle

Autor: Mun Ja Kim, Taesung Kim, Eok-bong Kim, Dong-Wook Shin, Jung Hun Lee, Seul-Gi Kim, Chan-Uk Jeon, Hee-Bom Kim, Ji-Beom Yoo, Jihoon Na, Soo-Young Kim, Hwan Chul Jeon, Roman Chalykh, Byung-Gook Kim

Publikováno v: Extreme Ultraviolet (EUV) Lithography VII.

Extreme ultraviolet (EUV) lithography has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10nm. Recently EUV pellicle introduction is required to improve particle level inside scanne

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::67f9240bb1ee7eaa6e40f943f6c4e050
https://doi.org/10.1117/12.2218228

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