Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Hung-Fei Kuo"'
Autor:
Jinyang Li, Hung-Fei Kuo
Publikováno v:
IEEE Photonics Journal, Vol 15, Iss 6, Pp 1-7 (2023)
Overlay is a crucial indicator of manufacturing processing between layers. Currently, diffraction-based overlay (DBO) is widely adopted in overlay metrology. In response to existing challenges in DBO metrology, this study applied the concept of optic
Externí odkaz:
https://doaj.org/article/dc037f0221b542a197ac996cfd171ddb
Autor:
Wei-Ming Kan, Yu-Ru Huang, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Yu-Shin Lin, Hung-Fei Kuo
Publikováno v:
IEEE Access, Vol 7, Pp 86064-86076 (2019)
Resolution enhancement techniques compatible with an ArF (193 nm) immersion optical lithography system may constitute an effective means of minimizing the size of technology nodes of the dynamic random access memory. This paper investigated one such
Externí odkaz:
https://doaj.org/article/7bc5bd853e7e40399e0dd52fe73bf085
Publikováno v:
IEEE Access, Vol 5, Pp 6421-6428 (2017)
This paper describes the use of ArF immersion lithography to verify the feasibility of a self-developed freeform illumination source that exposes features on masks and forms resist patterns. After development inspection (ADI) was used to measure the
Externí odkaz:
https://doaj.org/article/91754be624904af4b998d37d329894f7
Publikováno v:
IEEE Access, Vol 4, Pp 6739-6748 (2016)
This paper applied a radial basis function network (RBFN) in coherent Fourier scatterometry (CFS) to reconstruct the linewidth of periodic line/space (L/S) patterns. The fast, nondestructive, and repeatable measurement capability of CFS enables its i
Externí odkaz:
https://doaj.org/article/75c732ffcf784f119cde345d0311edf3
Publikováno v:
IEEE Access, Vol 4, Pp 6225-6230 (2016)
This paper investigates the manufacturability-aware process of p-n junction formation for photovoltaic cells involving with Si nanoparticle layer. The furnace-based dopant diffusion process of forming a p-n junction consumes a substantial amount of e
Externí odkaz:
https://doaj.org/article/c2d90ddfb9004df085e305bbda24dbce
Autor:
Hung-Fei Kuo, Anifatul Faricha
Publikováno v:
IEEE Access, Vol 4, Pp 7479-7486 (2016)
Diffraction-based overlay (DBO) accuracy is critical to the intelligent nanolithography process control for producing advanced semiconductor fabrication nodes. Optical gratings located on various layers are commonly used as the targets for the detect
Externí odkaz:
https://doaj.org/article/bcdc4cb912ee4e0bba39a9d823ed1e60
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 33:373-382
Overlay metrology is crucial to process control in manufacturing semiconductor devices. Diffraction-based overlay (DBO) is an effective overlay measurement approach because it exhibits multiple advantages. This study analyzed measurement errors cause
Autor:
Chung-Chi Chen, Yu-Ting Huang, Bohr-Ran Huang, Shyankay Jou, Hung-Fei Kuo, Yueh-Ching Chung, Yi-Fang Hsieh, Nahid Kaisar
Publikováno v:
Surface and Coatings Technology. 337:434-438
Titanium nitride (TiN) thin films were prepared by RF magnetron sputtering on a bare Si surface and a silicone-oil-covered Si surface as surface-enhanced Raman scattering (SERS) substrates. The TiN film deposited on the bare Si surface had a flat sur
Publikováno v:
Optics and Lasers in Engineering. 101:106-112
This study used a digital micromirror device (DMD) to produce point-array patterns and employed a self-developed optical system to define line-and-space patterns on nonplanar substrates. First, field tracing was employed to analyze the aerial images
Publikováno v:
ASP-DAC
With the dramatically increase of design complexity and the advance of semiconductor technology nodes, huge difficulties appear during design for manufacturability with existing lithography solutions. Sub-resolution assist feature (SRAF) insertion an