Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Huijbrechts, P.A.H.J."'
Publikováno v:
In Journal of Electrostatics May 2001 51-52:218-224
Publikováno v:
XIII International Conference on Gas Discharges and their Applications, Glasgow, U.K., 2, 724-727
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::b638e9a486cadb522adfdf60b3027e37
https://research.tue.nl/nl/publications/a5bb135d-89ca-4003-953b-c64bcdde93d7
https://research.tue.nl/nl/publications/a5bb135d-89ca-4003-953b-c64bcdde93d7
Autor:
Yan, K., Heesch, van, E.J.M., Pemen, A.J.M., Huijbrechts, P.A.H.J., Gompel, van, F.M., Matyas, Z., Leuken, van, H.E.M.
Publikováno v:
Proc. 35th IEEE Industrial Applications Society Annual Meeting and World Conference on Industrial Applications of Electrical Energy, 592-599
STARTPAGE=592;ENDPAGE=599;TITLE=Proc. 35th IEEE Industrial Applications Society Annual Meeting and World Conference on Industrial Applications of Electrical Energy
STARTPAGE=592;ENDPAGE=599;TITLE=Proc. 35th IEEE Industrial Applications Society Annual Meeting and World Conference on Industrial Applications of Electrical Energy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::352faed71f6c19d39b5b5addd943310e
https://research.tue.nl/nl/publications/57339293-e220-4ea4-93d4-65704efcda00
https://research.tue.nl/nl/publications/57339293-e220-4ea4-93d4-65704efcda00
Publikováno v:
VIIth International Symposium on High Pressure, Low Temperature, Plasma Chemistry, Greifswald, Germany, 1, 68-72
Plasma Chemistry and Plasma Processing, 21(1), 107-137. Springer
Plasma Chemistry and Plasma Processing, 21(1), 107-137. Springer
This paper discusses the global chemical kinetics of corona plasma-induced chemical reactions for pollution control. If there are no significant radical termination reactions, the pollution remoûal linearly depends on the corona energy density and/
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::09eb88d067f10f7f13817f2790995ae2
https://research.tue.nl/nl/publications/2050b10f-9760-4929-827c-7b7c228c4b43
https://research.tue.nl/nl/publications/2050b10f-9760-4929-827c-7b7c228c4b43
Autor:
Heesch, van, E.J.M., Pemen, A.J.M., Yan, K., Blom, P.P.M., Huijbrechts, P.A.H.J., Laan, van der, P.C.T., Pisarczyk, P., Pisarczyk, J., Wolowski, J.
Publikováno v:
Proceedings of the 24th International Conference on Phenomena in Ionised Gases (XXIV ICPIG 1999), 11-16 July 1999, Warsaw, Poland
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::5426a9453eebcf156eccfb9c01d9bec7
https://research.tue.nl/nl/publications/5ae3e279-5ff6-45f1-b969-04268203a077
https://research.tue.nl/nl/publications/5ae3e279-5ff6-45f1-b969-04268203a077
Autor:
Heesch, van, E.J.M., Yan, K., Pemen, A.J.M., Huijbrechts, P.A.H.J., Gompel, van, F.M., Matyas, Z., Gommers, K.P.M., Paasen, van, S.V.B., Leuken, van, H.E.M., Laan, van der, P.C.T.
Publikováno v:
14th International Symposium on Plasma Chemistry, 1063-1068
STARTPAGE=1063;ENDPAGE=1068;TITLE=14th International Symposium on Plasma Chemistry
STARTPAGE=1063;ENDPAGE=1068;TITLE=14th International Symposium on Plasma Chemistry
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::1c8fc0b8c0c91bdc54a509c771a88ca8
https://research.tue.nl/nl/publications/2ed17d0b-e306-4629-818b-1390ee1765bb
https://research.tue.nl/nl/publications/2ed17d0b-e306-4629-818b-1390ee1765bb
Autor:
Heesch, van, E.J.M., Pemen, A.J.M., Yan, K., Paasen, van, S.V.B., Ptasinski, K.J., Matyas, Z., Huijbrechts, P.A.H.J., Hultermans, B.O.E., Nicoletti, A., Zacharias, P.
Publikováno v:
12th IEEE International Pulsed Power Conference, 1, 515-518
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::1eee6bc5c5d43a5427935dfe8e505397
https://research.tue.nl/nl/publications/26a71b28-f560-44b7-89f4-5e35400bd40a
https://research.tue.nl/nl/publications/26a71b28-f560-44b7-89f4-5e35400bd40a
Publikováno v:
Conference Record of the 2000 Twenty-fourth International Power Modulator Symposium; 2000, p25-28, 4p
Autor:
Yan, K., van Heesch, E.J.M., Pemen, A.J.M., Huijbrechts, P.A.H.J., van Gompel, F.M., van Leuken, H., Matyas, Zdenek
Publikováno v:
IEEE Transactions on Industry Applications; May/Jun2002, Vol. 38 Issue 3, p866, 7p, 7 Black and White Photographs, 5 Diagrams, 3 Graphs
Akademický článek
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