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pro vyhledávání: '"Huei-Cheng Li"'
Autor:
Huei-Cheng Li, 李暉成
100
Effects of the C2H4/(C2H4+NH3) ratios on the properties of thermal chemical vapor deposition (CVD) carbon films are investigated. Five kinds of carbon films are deposited with the C2H4/(C2H4+NH3) ratio of 60, 70, 80, 90, and 100 %. The depos
Effects of the C2H4/(C2H4+NH3) ratios on the properties of thermal chemical vapor deposition (CVD) carbon films are investigated. Five kinds of carbon films are deposited with the C2H4/(C2H4+NH3) ratio of 60, 70, 80, 90, and 100 %. The depos
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/61153121190364291527
Publikováno v:
ECS Journal of Solid State Science and Technology. 2:N80-N88
When ethylene/ammonia (C2H4/NH3) mixtures are used to deposit carbon films by thermal chemical vapor deposition (CVD), effects of C2H4/(C2H4+NH3) ratios on the deposition rate and microstructures of carbon films are investigated. Experimental results
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a68031ac5312ee20ae18ce80cf4db338
https://doi.org/10.1149/2.023304jss
https://doi.org/10.1149/2.023304jss
Publikováno v:
Journal of The Electrochemical Society. 159:D77-D83
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad8469284754c3c7234158a574aff743
https://doi.org/10.1149/2.051202jes
https://doi.org/10.1149/2.051202jes
Publikováno v:
Journal of The Electrochemical Society; 2012, Vol. 159 Issue 2, pD77-D83, 7p