Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Hubert Caquineau"'
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2012, 206 (23), pp.4814-4821. ⟨10.1016/j.surfcoat.2012.04.091⟩
Surface and Coatings Technology, Elsevier, 2012, 206 (23), pp.4814-4821. ⟨10.1016/j.surfcoat.2012.04.091⟩
International audience; In this work silicon oxide has been deposited from silane on fluidized polyethylene powders placed in far cold remote nitrogen/oxygen plasma. The process temperature remained below 100°C. The influence on the powder wettabili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::853997f677a6429cca9e6e7ddc100af6
https://doi.org/10.1016/j.surfcoat.2012.04.091
https://doi.org/10.1016/j.surfcoat.2012.04.091
Autor:
Hubert Caquineau, Simon Dap, X. Lin, M. C. Bouzidi, Nicolas Naudé, Clémence Tyl, N. Gherardi, P. Ségur
Publikováno v:
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2018, 51 (35), pp.354001. ⟨10.1088/1361-6463/aad472⟩
Journal of Physics D: Applied Physics, IOP Publishing, 2018, 51 (35), pp.354001. ⟨10.1088/1361-6463/aad472⟩
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::597bc90585e8802eb3160120ad77eb10
https://doi.org/10.1088/1361-6463/aad472
https://doi.org/10.1088/1361-6463/aad472
Autor:
Patrice Raynaud, I. Enache, Thierry Paulmier, I. Savin de Larclause, Nicolas Gherardi, Hubert Caquineau, Françoise Massines
Publikováno v:
IEEE Transactions on Plasma Science. 37:970-978
In this paper, homogeneous and dense silicon-based coatings have been deposited from hexamethyldisiloxane (HMDSO: Si2O(CH3)6) on patterned silicium in a Townsend dielectric barrier discharge operating at atmospheric pressure. A brief description of t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a0d9a48a38a88f6e3aa00f975ba41407
https://doi.org/10.1109/tps.2009.2017023
https://doi.org/10.1109/tps.2009.2017023
Autor:
Nicolas Gherardi, Louison Maechler, Hubert Caquineau, Ionut Enache, Francoise Massines, Thierry Paulmier
Publikováno v:
Plasma Processes and Polymers. 4:806-814
This paper focuses on the understanding of the main mechanisms that participate in the growth process of an SiO 2 -like film in an atmospheric pressure Townsend discharge in N 2 with small ad-mixtures of HMDSO and N 2 O. The approach consists of anal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8579c6060b2152025d98c4314e7e497e
https://doi.org/10.1002/ppap.200700073
https://doi.org/10.1002/ppap.200700073
Publikováno v:
Plasma Processes and Polymers. 2:45-52
In this paper, the gas phase composition of hexamethyldisiloxane (HMDSO) microwave plasma at 4 × 10 - 3 mbar and of the corresponding films were studied by FTIR spectroscopy under different power conditions. At low powers, species with a chemical st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31bece13ea5c721ac85e64c401ce0a30
https://doi.org/10.1002/ppap.200400034
https://doi.org/10.1002/ppap.200400034
Publikováno v:
Surface and Coatings Technology. :1042-1048
In-situ diagnostic measurements and reactor modeling have been used to study N 2 O dissociation by r.f. discharges. Measurements have been conducted at I Torr (i.e. 133.3 Pa) and at a r.f. power density from 4.8 to 22.7 mW/cm 2 We developed a complet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95e5d36b24fa12b38f2797df64efa1de
https://doi.org/10.1016/s0257-8972(99)00287-x
https://doi.org/10.1016/s0257-8972(99)00287-x
Autor:
Bernard Despax, Hubert Caquineau
Publikováno v:
Chemical Engineering Science. 52:2901-2914
Based on a chemical mechanism whose reliability has already been established in a previous paper, two-dimensional models for some normally employed reactors, namely, longitudinal flow, radial flow and showerhead reactors were developed in the case of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5da229b14cf555cd01ac0f8e041ee28a
https://doi.org/10.1016/s0009-2509(97)84656-8
https://doi.org/10.1016/s0009-2509(97)84656-8
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:2071-2082
Plasma deposition processes involve complex phenomena which make the design and optimization of industrial equipments difficult. In the particular case of silane‐ammonia plasmas to produce silicon nitride (at very low silane percentage), two flow a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30661fb40020da3844ed8273ac7ef755
https://doi.org/10.1116/1.580083
https://doi.org/10.1116/1.580083
Publikováno v:
The European Physical Journal Applied Physics. 73:20801
Dielectric barrier discharge (DBD) deposition of thin films is increasingly studied as a promising alternative to other non-thermal processes such as low-pressure plasma-enhanced chemical vapor deposition (PECVD) or wet-coating. In this paper we demo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a212c3dc770e2125e861d6e44f398ae3
https://doi.org/10.1051/epjap/2016150525
https://doi.org/10.1051/epjap/2016150525
Autor:
Hubert Caquineau, Bernard Despax, Hugues Vergnes, Lynda Aiche, Brigitte Caussat, H.M. Alfaro-López
Publikováno v:
Springer Proceedings in Physics ISBN: 9783540959298
In this work, nitrogen was grafted on the surface of polyethylene powders in a fluidized bed coupled to a nitrogen microwave post-discharge, under low pressure (10Torr) and low temperature (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::086e759fa3f8a5230e5cf3f9d360e917
https://doi.org/10.1007/978-3-540-95930-4_13
https://doi.org/10.1007/978-3-540-95930-4_13
