Zobrazeno 1 - 10
of 50
pro vyhledávání: '"Hrunski, D."'
Publikováno v:
In Thin Solid Films 1 April 2013 532:56-59
Autor:
Hrunski, D., Mootz, F., Zeuner, A., Janssen, A., Rost, H., Beckmann, R., Binder, S., Schüngel, E., Mohr, S., Luggenhölscher, D., Czarnetzki, U., Grabosch, G.
Publikováno v:
In Vacuum January 2013 87:114-118
Publikováno v:
In Thin Solid Films 2009 517(14):4188-4191
Publikováno v:
In Thin Solid Films 2009 517(11):3370-3377
Publikováno v:
In Thin Solid Films 2008 516(14):4639-4644
Publikováno v:
In Thin Solid Films 2008 516(5):818-821
Publikováno v:
Journal of Applied Physics; Jan2010, Vol. 107 Issue 1, p013708-013715, 8p, 2 Charts, 8 Graphs
Autor:
Kilper, T., Beyer, W., Bräuer, G., Bronger, T., Carius, R., van den Donker, M. N., Hrunski, D., Lambertz, A., Merdzhanova, T., Mück, A., Rech, B., Reetz, W., Schmitz, R., Zastrow, U., Gordijn, A.
Publikováno v:
Journal of Applied Physics; Apr2009, Vol. 105 Issue 7, p074509-074509-10, 10p, 10 Graphs
27th European Photovoltaic Solar Energy Conference and Exhibition; 2511-2516
The Electrical Asymmetry Effect (EAE) allows controlling the plasmas properties during thin silicon film deposition. The experiments clearly demonstrate that EAE techni
The Electrical Asymmetry Effect (EAE) allows controlling the plasmas properties during thin silicon film deposition. The experiments clearly demonstrate that EAE techni
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d0e2b1700a4863806f5946616b3fe91
