Výsledky vyhledávání - "Houck, William E."

Conference

Role of process in obtaining optimum lithographic information from chemically amplified resists.

Autor: Szmanda, Charles R., Fedynyshyn, Theodore H., Houck, William E., Root, Jonathan C., Blacksmith, Robert F.

Publikováno v: Proceedings of SPIE; 11/ 1/1994, Issue 1, p269-284, 16p

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Conference

Relationship between resist performance and diffusion in chemically amplified resist systems.

Autor: Fedynyshyn, Theodore H., Szmanda, Charles R., Blacksmith, Robert F., Houck, William E.

Publikováno v: Proceedings of SPIE; Nov1993, Issue 1, p2-13, 12p

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Akademický článek

Relationship between resist performance and reaction order in a chemically amplified resist system.

Autor: Fedynyshyn, Theodore H., Szmanda, Charles R., Blacksmith, Robert F., Houck, William E., Root, Jonathan C.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2798-2806, 9p

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Periodical

Reading Missouri Medicine for the Medicine.

Autor: Houck, William E.

Publikováno v: Missouri Medicine; Mar/Apr2015, Vol. 112 Issue 2, p109-109, 1/3p

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