Zobrazeno 1 - 6 of 6 pro vyhledávání: '"Hotaka Endo"'
1
Condensation mechanism of microbubbles depending on DFR pattern design
Autor: Hotaka Endo, Tomotaka Ariga, Akira Kawai
Publikováno v: Microelectronic Engineering. 83:1167-1169
The condensation mechanism of the microbubble is analyzed thermodynamically. Particularly, the microbubble condensation is controlled by the dry film resist (DFR) pattern design. As the bubble condensation analysis, deionized water (DI water) is drop
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0df8ca4e4f882fdfc6eed165e4416bd0
https://doi.org/10.1016/j.mee.2006.01.030
Zobrazit plný text záznamu
2
Adhesion and removal of micro bubbles for immersion lithography
Autor: Hotaka Endo, Osamu Tamada, Akira Kawai, Masakazu Sanada, Atsushi Ishikawa, Kenta Suzuki, Takayoshi Niiyama, Masaki Yamanaka
Publikováno v: SPIE Proceedings.
It is necessary to develop a nano-bubble detector similar as a conventional particle counter for reducing micro and nano defects caused by nano-bubble (NB) in immersion lithography. In this regard, we discuss adhesion and removal mechanisms of NB adh
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9a29bfe25f64ae7db94a96bf829654f5
https://doi.org/10.1117/12.655444
Zobrazit plný text záznamu

Vyhledávací nástroje:

Upřesnit hledání

Omezení vyhledávání
Plný text Recenzováno Digitální knihovna AV ČR
Zdroje